Atomic Layer Deposition of PbI2 Thin Films von Popov, Georgi, Mattinen, Miika, Hatanpää, Timo, Vehkamäki, Marko, Kemell, Marianna, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Noble Metals and Their Oxides von Hämäläinen, Jani, Ritala, Mikko, Leskelä, Markku

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Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends von Miikkulainen, Ville, Leskelä, Markku, Ritala, Mikko, Puurunen, Riikka L.

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Review Article: Atomic layer deposition of optoelectronic materials von Leskelä, Markku, Mattinen, Miika, Ritala, Mikko

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Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition von Jang, Woochool, Jeon, Heeyoung, Kang, Chunho, Song, Hyoseok, Park, Jingyu, Kim, Hyunjung, Seo, Hyungtak, Leskela, Markku, Jeon, Hyeongtag

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Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films von Blanquart, Timothee, Niinistö, Jaakko, Heikkilä, Mikko, Sajavaara, Timo, Kukli, Kaupo, Puukilainen, Esa, Xu, Chongying, Hunks, William, Ritala, Mikko, Leskelä, Markku

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Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars von Caldwell, Joshua D, Glembocki, Orest J, Bezares, Francisco J, Kariniemi, Maarit I, Niinistö, Jaakko T, Hatanpää, Timo T, Rendell, Ronald W, Ukaegbu, Maraizu, Ritala, Mikko K, Prokes, Sharka M, Hosten, Charles M, Leskelä, Markku A, Kasica, Richard

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A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes von Chernichenko, Konstantin, Madarász, Ádám, Pápai, Imre, Nieger, Martin, Leskelä, Markku, Repo, Timo

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics von Mattinen, Miika, Popov, Georgi, Vehkamäki, Marko, King, Peter J, Mizohata, Kenichiro, Jalkanen, Pasi, Räisänen, Jyrki, Leskelä, Markku, Ritala, Mikko

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Atomic Layer Deposition of ScF3 and Sc x Al y F z Thin Films von Atosuo, Elisa, Heikkilä, Mikko J., Majlund, Johanna, Pesonen, Leevi, Mäntymäki, Miia, Mizohata, Kenichiro, Leskelä, Markku, Ritala, Mikko

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Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond von Mattinen, Miika, Leskelä, Markku, Ritala, Mikko

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Chiral Molecular Tweezers: Synthesis and Reactivity in Asymmetric Hydrogenation von Lindqvist, Markus, Borre, Katja, Axenov, Kirill, Kótai, Bianka, Nieger, Martin, Leskelä, Markku, Pápai, Imre, Repo, Timo

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Effect of Filler Loading on Mechanical and Tribological Properties of Wood Apple Shell Reinforced Epoxy Composite von Shakuntala, Ojha, Samir Kumar, Acharya, Raghavendra, Gujjala

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Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3 von Weiß, Alexander, Terletskaia, Mariia, Popov, Georgi, Mizohata, Kenichiro, Leskelä, Markku, Ritala, Mikko, Kemell, Marianna

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Atomic layer deposition (ALD): from precursors to thin film structures von Leskelä, Markku, Ritala, Mikko

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Precursors as enablers of ALD technology: Contributions from University of Helsinki von Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

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Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO2 von Blanquart, Timothee, Niinistö, Jaakko, Gavagnin, Marco, Longo, Valentino, Pallem, Venkateswara R, Dussarrat, Christian, Ritala, Mikko, Leskelä, Markku

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Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films von Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Molecular Tweezers for Hydrogen: Synthesis, Characterization, and Reactivity von Sumerin, Victor, Schulz, Felix, Atsumi, Michiko, Wang, Cong, Nieger, Martin, Leskelä, Markku, Repo, Timo, Pyykkö, Pekka, Rieger, Bernhard

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Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium von Pore, Viljami, Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

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