The effect of substrate temperature on P-CVD deposited a-SiGe : H films von Rashad, Abduljabbar, Sali, Jaydeep V., Marathe, B.R., Takwale, M.G., Shaligram, A.D.

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Structural properties of SnO2: F films deposited by spray pyrolysis von CHITRA AGASHE, TAKWACE, M. G, MARATHE, B. R, BHIDE, V. G

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Interelectrode separation effects on a-SiGe:H films prepared by plasma chemical vapor deposition von Sali, Jaydeep V, Rashad, Abduljabbar, Marathe, B.R, Takwale, M.G, Gangurde, K.D, Shaligram, A.D

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Preparation of highly conductive p-type μc-Si:H window layer using lower concentration of hydrogen in the rf glow discharge plasma von Sali, Jaydeep V., Panaskar, Varsha D., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Structural properties of SnO2: F films deposited by spray pyrolysis technique von Agashe, Chitra, Marathe, B.R., Takwale, M.G., Bhide, V.G.

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Influence of annealing on evaporated indium oxide thin films von Rozati, S.M., Mirzapour, S., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Dependence of structural and electrical properties of undoped spray-deposited indium oxide thin films on deposition temperature von Mirzapour, S., Rozati, S.M., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Effect of Sn concentration in the precursor solution on the growth of sprayed SnO 2 films von Agashe, Chitra, Goyal, D.J., Marathe, B.R., Takwale, M.G., Bhide, V.G.

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Characterization of as-deposited and annealed indium oxide thin films von Rozati, S.M., Mirzapour, S., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Influence of air flow rate on structural and electrical properties of undoped indium oxide thin films von Mirzapour, S., Rozati, S.M., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Effect of Sn concentration in the precursor solution on the growth of sprayed SnO2 films von AGASHE, C, GOYAL, D. J, MARATHE, B. R, TAKWALE, M. G, BHIDE, V. G

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Dependence of structural, electrical and optical properties of undoped indium oxide films on thickness von Mirzapour, S., Rozati, S.M., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Structural properties of SnO 2: F films deposited by spray pyrolysis technique von Agashe, Chitra, Marathe, B.R., Takwale, M.G., Bhide, V.G.

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Contact resistance characteristics of the low cost [formula omitted] thin film resistor system von Nahar, R.K., Khanna, V.K., Marathe, B.R.

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Variation of nichrome film resistance during deposition von Jain, R.K., Marathe, B.R.

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Structural properties of SnO 2: F films deposited by spray pyrolysis von Agashe, Chitra, Takwale, M.G., Marathe, B.R., Bhide, V.G.

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The properties of ZnSnAs 2 and CdSnAs 2 von Gasson, D.B., Holmes, P.J., Jennings, I.C., Marathe, B.R., Parrott, J.E.

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Systematic study of the process parameters affecting hydrogen plasma passivation of polycrystalline silicon and polycrystalline silicon solar cells von Arole, V.M., Dusane, R.O., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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Influence of process parameters on the electrical transport mechanism in sprayed CdS films von Kolhe, Shailaja, Kulkarni, S.K., Takwale, M.G., Marathe, B.R., Bhide, V.G.

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The properties of ZnSnAs2 and CdSnAs2 von Gasson, D.B., Holmes, P.J., Jennings, I.C., Marathe, B.R., Parrott, J.E.

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