Resolution Limits of Electron-Beam Lithography toward the Atomic Scale von Manfrinato, Vitor R, Zhang, Lihua, Su, Dong, Duan, Huigao, Hobbs, Richard G, Stach, Eric A, Berggren, Karl K

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Anisotropic Etching and Nanoribbon Formation in Single-Layer Graphene von Campos, Leonardo C, Manfrinato, Vitor R, Sanchez-Yamagishi, Javier D, Kong, Jing, Jarillo-Herrero, Pablo

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Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale von Manfrinato, Vitor R, Stein, Aaron, Zhang, Lihua, Nam, Chang-Yong, Yager, Kevin G, Stach, Eric A, Black, Charles T

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High-Energy Surface and Volume Plasmons in Nanopatterned Sub-10 nm Aluminum Nanostructures von Hobbs, Richard G, Manfrinato, Vitor R, Yang, Yujia, Goodman, Sarah A, Zhang, Lihua, Stach, Eric A, Berggren, Karl K

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Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design von Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., Black, Charles T.

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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale von Duan, Huigao, Manfrinato, Vitor R., Yang, Joel K. W., Winston, Donald, Cord, Bryan M., Berggren, Karl K.

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Focused-helium-ion-beam blow forming of nanostructures: radiation damage and nanofabrication von Kim, Chung-Soo, Hobbs, Richard G, Agarwal, Akshay, Yang, Yang, Manfrinato, Vitor R, Short, Michael P, Li, Ju, Berggren, Karl K

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Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function von Manfrinato, Vitor R, Wen, Jianguo, Zhang, Lihua, Yang, Yujia, Hobbs, Richard G, Baker, Bowen, Su, Dong, Zakharov, Dmitri, Zaluzec, Nestor J, Miller, Dean J, Stach, Eric A, Berggren, Karl K

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1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019... von Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., Black, Charles T.

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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist von Duan, Huigao, Winston, Donald, Yang, Joel K. W., Cord, Bryan M., Manfrinato, Vitor R., Berggren, Karl K.

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Neon Ion Beam Lithography (NIBL) von Winston, Donald, Manfrinato, Vitor R, Nicaise, Samuel M, Cheong, Lin Lee, Duan, Huigao, Ferranti, David, Marshman, Jeff, McVey, Shawn, Stern, Lewis, Notte, John, Berggren, Karl K

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope von Camino, Fernando E, Manfrinato, Vitor R, Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A, Black, Charles T

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The Orientations of Large Aspect-Ratio Coiled-Coil Proteins Attached to Gold Nanostructures von Chang, Jae-Byum, Kim, Yong Ho, Thompson, Evan, No, Young Hyun, Kim, Nam Hyeong, Arrieta, Jose, Manfrinato, Vitor R., Keating, Amy E., Berggren, Karl K.

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Electrochemical development of hydrogen silsesquioxane by applying an electrical potential von Strobel, Sebastian, Harry, Katherine J, Duan, Huigao, Yang, Joel K W, Manfrinato, Vitor R, Berggren, Karl K

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Controlled placement of colloidal quantum dots in sub-15 nm clusters von Manfrinato, Vitor R, Wanger, Darcy D, Strasfeld, David B, Han, Hee-Sun, Marsili, Francesco, Arrieta, Jose P, Mentzel, Tamar S, Bawendi, Moungi G, Berggren, Karl K

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Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist von Manfrinato, Vitor R., Cheong, Lin Lee, Duan, Huigao, Winston, Donald, Smith, Henry I., Berggren, Karl K.

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Electrochemical development of hydrogen silsesquioxane by applying an electrical potential von Strobel, Sebastian, Harry, Katherine J, Duan, Huigao, Yang, Joel K W, Manfrinato, Vitor R, Berggren, Karl K

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Patterning Si at the 1 nm Length Scale with Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design von Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., Black, Charles T.

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope von Camino, Fernando E., Manfrinato, Vitor R., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., Black, Charles T.

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Resolution Limits of Electron-Beam Lithography toward the Atomic Scale von Manfrinato, Vitor R., Zhang, Lihua, Su, Dong, Duan, Huigao, Hobbs, Richard G., Stach, Eric A., Berggren, Karl K.

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