Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma von Kitajima, T., Takeo, Y., Petrović, Z. Lj, Makabe, T.

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In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching von OHMORI, T, MAKABE, T

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Functional separation in two frequency operation of an inductively coupled plasma von Denda, T., Miyoshi, Y., Komukai, Y., Goto, T., Petrović, Z. Lj, Makabe, T.

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A set of cross sections and transport coefficients for electrons in HBr von Šašić, O., Dujko, S., Makabe, T., Petrović, Z.Lj

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This special issue resulted from the International Workshop on Basis of Low Temperature Plasma Applications which was held at Hakone in Japan on July 24–25, 2001 von Makabe, T

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Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O 2 von Hayashi, Y, Hirao, S, Zhang, Y, Gans, T, O'Connell, D, Petrović, Z Lj, Makabe, T

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Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2 von Hayashi, Y, Hirao, S, Zhang, Y, Gans, T, O'Connell, D, Petrović, Z Lj, Makabe, T

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Kinetic phenomena in electron transport in radio-frequency fields von Petrović, Z.Lj, Raspopović, Z.M., Dujko, S., Makabe, T.

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Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar von Ohmori, T., Goto, T. K., Kitajima, T., Makabe, T.

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Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching von Makabe, T., Petrović, Z.Lj

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Three dimensional freezing around a coolant-carrying tube von Sugawara, M., Komatsu, Y., Makabe, T., Beer, H.

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Modeling of radial uniformity at a wafer interface in a 2f-CCP for SiO2 etching von Yagisawa, T., Shimada, T., Makabe, T.

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Data and modeling of negative ion transport in gases of interest for production of integrated circuits and nanotechnologies von PETROVIC, Z. Lj, RASPOPOVIC, Z. M, STOJANOVIC, V. D, JOVANOVIC, J. V, MALOVIC, G, MAKABE, T, DE URQUIJO, J

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The serum level of vitamin D of endometriosis patients von Miyashita, M, Koga, K, Nagai, M, Taguchi, A, Sue, F, Makabe, T, Izumi, G, Takamura, M, Harada, M, Hirata, T, Hirota, Y, Osuga, Y, Fujii, T

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Modeling of N $_2$ –H $_2$ Capacitively Coupled Plasma for Low-k Material Etching von Shon, C.H., Makabe, T.

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Optical emission diagnostics of etching of low- k dielectrics in a two frequency inductively coupled plasma von Miyauchi, M., Miyoshi, Y., Petrović, Z.Lj, Makabe, T.

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Two-dimensional CT images of two-frequency capacitively coupled plasma von Kitajima, T., Takeo, Y., Makabe, T.

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Space-and Time-Resolved E-H Transition in an Inductively Coupled Plasma in Ar von Hirao, S., Hayashi, Y., Makabe, T.

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Prediction of a radial variation of plasma structure and ion distributions in the wafer interface in two-frequency capacitively coupled plasma von Yagisawa, T., Maeshige, K., Shimada, T., Makabe, T.

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Effect of aspect ratio on topographic dependent charging in oxide etching von Matsui, Jun, Maeshige, Kazunobu, Makabe, Toshiaki

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