Creation and Development of the Ion Beam Technology von Maishev, Yu. P.

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Calculation of the flow capacity of a gas channel in the sources of beams of fast neutral particles by means of the Monte-Carlo method von Kudrya, V. P., Maishev, Yu. P.

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Investigation into the selectivity of etching various materials by fast neutral particle beams von Maishev, Yu. P., Shevchuk, S. L., Kudrya, V. P.

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Mathematical simulation of an inclined neutralization channel for a plasma source of neutral beams von Degtyarev, A. V., Kudrya, V. P., Maishev, Yu. P.

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A system for precision reactive ion-beam etching of nanostructures for field-emission devices von Maishev, Yu. P., Terent’ev, Yu. P., Shevchuk, S. L., Tatarenko, N. I., Golikov, V. A.

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The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Features of resist-free formation of masking pattern by electron beam-induced vapor deposition von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Investigations of diamond-like carbon films produced directly from an ion beam of industrial ion source with a cold cathode von Enisherlova, K.L., Kontsevoi, Yu.A., Chervyakova, E.N., Mitrofanov, E.A., Maishev, Yu.P.

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