Preparation and Characterization of Low Dielectric Constant Films Using Silicon Sources von He, Zhi Wei, Lin, Hong Xiao, Mahajan, Ashok M., Gupta, Swati A., Li, Chun Yan, Zhou, Mei

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Investigation of PEALD ZrO2/La2O3-based high-k nanolaminates sandwiched between Al and Ti electrodes for MIM capacitors von Patil, Sumit R., Borokar, Vaibhav Y., Rasadujjaman, Md, Zhang, Jing, Ding, Shi J., Mahajan, Ashok M.

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The effect of post-deposition annealing on the chemical, structural and electrical properties of Al/ZrO2/La2O3/ZrO2/Al high-k nanolaminated MIM capacitors von Patil, Sumit R., Barhate, Viral N., Patil, Vilas S., Agrawal, Khushabu S., Mahajan, Ashok M.

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HfO2 gate dielectric on Ge (111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment von Agrawal, Khushabu S., Patil, Vilas S., Khairnar, Anil G., Mahajan, Ashok M.

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Sol–gel deposited ceria thin films as gate dielectric for CMOS technology von KHAIRNAR, ANIL G, MAHAJAN, ASHOK M

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Preparation of rare earth CeO2 thin films using metal organic decomposition method for metal-oxide–semiconductor capacitors von Agrawal, Khushabu S., Patil, Vilas S., Khairnar, Anil G., Mahajan, Ashok M.

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Tween-80 based ultra low-k (ULK) mesoporous films von Gupta, Swati A., Gaikwad, Anil S., Mahajan, Ashok M.

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Synthesis of SiOF nanoporous ultra low-k thin film von Mhaisagar, Yogesh S., Mahajan, Ashok M.

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Mechanical properties of surface modified silica low-k thin films von Mhaisagar, Yogesh S., Joshi, Bhavana N., Mahajan, Ashok M.

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Enhancement in mechanical properties of silica low-k thin films using wet chemical technique von Mhaisagar, Yogesh S, Gaikwad, Anil S, Khairnar, Anil G, Mahajan, Ashok M

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Synthesis and Characterization of Porogen Based Porous Low-k Thin Films von Pawar, Namrata B., Mhaisagar, Yogesh S., Gaikwad, Anil S., Mahajan, Ashok M.

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Deposition characterization of low- k hybrid thin films using methyl methacrylate for ULSI applications von Joshi, Bhavana N., Mahajan, Ashok M.

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Analysis of interconnect capacitance for sub nano CMOS technology using the low dielectric material von Joshi, Bhavana N., Mhaisagar, Yogesh S., Mahajan, Ashok M.

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Atomic layer deposited HfO2 ultra-thin films on different crystallographic orientation Ge for CMOS applications von Agrawal, Khushabu S., Patil, Vilas S., Mahajan, Ashok M.

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Performance enhancement of Al/La2O3/ZrO2/4H–SiC MOS device with LaON as interfacial passivation layer von Barhate, Viral N., Agrawal, Khushabu S., Patil, Vilas S., Patil, Sumit R., Mahajan, Ashok M.

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Investigation of Current Conduction Mechanism in HfO2 Thin Film on Silicon Substrate von Khairnar, Anil G., Agrawal, Khushaboo S., Patil, Vilas S., Mahajan, Ashok M.

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Capacitance-Voltage Measurement of SiO2/GeOxNy Gate Stack on Surface Passivated Germanium von Khairnar, Anil G., Patil, Vilas S., Mahajan, Ashok M.

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Ammonia Gas Sensing Characteristics of Chemically Synthesized Polyaniline Matrix von Bavane, Ravindra G, Shirsat, Mahendra D, Mahajan, Ashok M

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Ammonia Gas Sensing Characteristics of Spin Coated Polyaniline Films von Bavane, Ravindra Kumar G., Mahajan, Ashok M., Shirsat, Mahendra D., Gore, Ratnakar B.

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Association of Flavonifractor plautii, a Flavonoid-Degrading Bacterium, with the Gut Microbiome of Colorectal Cancer Patients in India von Gupta, Ankit, Dhakan, Darshan B., Maji, Abhijit, Saxena, Rituja, P.K., Vishnu Prasoodanan, Mahajan, Shruti, Pulikkan, Joby, Kurian, Jacob, Gomez, Andres M., Scaria, Joy, Amato, Katherine R., Sharma, Ashok K., Sharma, Vineet K.

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