Ionic Liquid for Directed Self-Assembly of PS-b-PMMA von Kawaue, Akiya, Matsumiya, Tasuku, Seo, Takehito, Maehashi, Takaya, Seshimo, Takehiro, Yamano, Hitoshi, Miyagi, Ken, Dazai, Takahiro, Chen, Xuanxuan, Rincon-Delgadillo, Paulina, Gronheid, Roel, Nealey, Paul F., Ohmori, Katsumi

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Resolution of 1,2,3,3a,4,8b-Hexahydrocyclopenta[b]indole via Diastereomeric Salt Formation with N-Tosyl-(R)-phenylglycine von Higashijima, Shinji, Inoue, Yukiko, Maehashi, Takaya, Miura, Hidetoshi, Kubota, Yasuhiro, Funabiki, Kazumasa, Matsui, Masaki

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Near-Infrared Fluorescent 2,3-Dicyanopyrazines von Matsui, Masaki, Maehashi, Takaya, Funabiki, Kazumasa

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Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography von Sunday, Daniel F, Chen, Xuanxuan, Albrecht, Thomas R, Nowak, Derek, Rincon Delgadillo, Paulina, Dazai, Takahiro, Miyagi, Ken, Maehashi, Takaya, Yamazaki, Akiyoshi, Nealey, Paul F, Kline, R. Joseph

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Ionic Liquids as Additives to Polystyrene-Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features von Chen, Xuanxuan, Zhou, Chun, Chen, Shuang-Jun, Craig, Gordon S. W, Rincon-Delgadillo, Paulina, Dazai, Takahiro, Miyagi, Ken, Maehashi, Takaya, Yamazaki, Akiyoshi, Gronheid, Roel, Stoykovich, Mark P, Nealey, Paul F

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Ionic Liquids as Additives to Polystyrene-Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features von Chen, Xuanxuan, Zhou, Chun, Chen, Shuang-Jun, Craig, Gordon S. W., Rincon-Delgadillo, Paulina, Dazai, Takahiro, Miyagi, Ken, Maehashi, Takaya, Yamazaki, Akiyoshi, Gronheid, Roel, Stoykovich, Mark P., Nealey, Paul F.

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Resist composition and method of forming resist pattern von Komuro, Yoshitaka, Maehashi, Takaya

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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN von MAEHASHI, Takaya, KOMURO, Yoshitaka

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Resist composition and method of forming resist pattern von Onishi, Koshi, Maehashi, Takaya, Arai, Masatoshi

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Resist composition, method of forming resist pattern, polymeric compound, and compound von Onishi, Koshi, Maehashi, Takaya, Arai, Masatoshi

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Resist composition and method of forming resist pattern von KOMURO, YOSHITAKA, MAEHASHI, TAKAYA

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Resist composition, method of forming resist pattern, compound, and acid generator von Ikeda, Takuya, Maehashi, Takaya, Arai, Masatoshi

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Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist... von Kataoka, Sho, Komuro, Yoshitaka, Kawana, Daisuke, Yoshigoe, Yusuke, Maehashi, Takaya, Inari, Takatoshi, Arai, Masatoshi, Sue, Kiwamu

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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN von ONISHI, Koshi, MAEHASHI, Takaya, ARAI, Masatoshi

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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND von ONISHI, Koshi, MAEHASHI, Takaya, ARAI, Masatoshi

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Method of producing block copolymer capable of creating specific structure pattern von Hayakawa, Teruaki, Kawana, Daisuke, Komuro, Yoshitaka, Maehashi, Takaya, Yamazaki, Seina, Yamazaki, Akiyoshi, Odashima, Rin

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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN von SUE, Kiwamu, KATAOKA, Sho, INARI, Takatoshi, MAEHASHI, Takaya, KOMURO, Yoshitaka, KAWANA, Daisuke, ARAI, Masatoshi

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Resist composition and method of forming resist pattern von ONISHI, KOSHI, ARAI, MASATOSHI, MAEHASHI, TAKAYA

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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR von MAEHASHI, Takaya, ARAI, Masatoshi, IKEDA, Takuya

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Resist composition and method of forming resist pattern von KOMURO, YOSHITAKA, MAEHASHI, TAKAYA

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