Evolution of rivulets during spreading of an impinging water jet on a rotating, precoated substrate von Ylitalo, Andrew S., Walls, Daniel J., Mui, David S. L., Frostad, John M., Fuller, Gerald G.

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Factors Influencing Drying Induced Pattern Collapse von Mui, David S.L., Kawaguchi, Mark, Musselwhite, Nathan

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Spreading of rinsing liquids across a horizontal rotating substrate von Walls, Daniel J., Ylitalo, Andrew S., Mui, David S. L., Frostad, John M., Fuller, Gerald G.

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Enhanced particle removal using viscoelastic fluids von Walker, Travis W., Hsu, Tienyi T., Fitzgibbon, Sean, Frank, Curtis W., Mui, David S. L., Zhu, Ji, Mendiratta, Arjun, Fuller, Gerald G.

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SiO2 Etching with Aqueous HF: Design and Development of a Laboratory-Scale Integrated Wet Etch/Dry Reactor von PANDE, Ashish A, MUI, David S. L, HESS, Dennis W

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Wafer Surface Charging Model for Single-Wafer Wet-Spin Processes von Mui, D. S. L., Lenz, E. H., Cyterski, C., Venkataraman, K., Kawaguchi, M.

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Design of a Novel Wet-Etch Reactor and Etch Chemistries: Simulations and Experimental Verification von Pande, Ashish, Levitin, Galit, Mui, David S., Hess, Dennis

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Line-profile and critical-dimension monitoring using a normal incidence optical CD metrology von Weidong Yang, Jiangtao Hu, Lowe-Webb, R., Korlahalli, R., Shivaprasad, D., Sasano, H., Wei Liu, Mui, D.S.L.

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Effects of surface recombination on carrier distributions and device characteristics von Mui, David S. L., Coldren, L. A.

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Explicit formulas of normalized radiation modes in multilayer waveguides von San-Liang Lee, Mui, S.D.L., Coldren, L.A.

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METHOD OF REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUCTURES von YASSERI, AMIR A, YUN, SEOKMIN, ZHU, JI, MIKHAYLICHENKO, KATRINA, MUI, DAVID S.L

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Method and apparatus for controlling etch processes during fabrication of semiconductor devices von LIU WEI, SASANO HIROKI, MUI DAVID S.L

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METHOD OF REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUCTURES von YASSERI, AMIR A, YUN, SEOKMIN, ZHU, JI, MIKHAYLICHENKO, KATRINA, MUI, DAVID S.L

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METHOD OF REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUCTURES von YASSERI, AMIR A, YUN, SEOKMIN, ZHU, JI, MIKHAYLICHENKO, KATRINA, MUI, DAVID S.L

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METHOD FOR REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUCTURES von YASSERI AMIR A, YUN SEOKMIN, MIKHAYLICHENKO KATRINA, ZHU JI, MUI DAVID S.L

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High-field electron-drift velocity and temperature in gallium phosphide von ARORA, V. K, MUI, D. S. L, MORKOC, H

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Mobility degradation and transferred electron effect in gallium arsenide and indium gallium arsenide von Arora, V.K., Mui, D.S.L., Morkoc, H.

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Chamber stability monitoring using an integrated metrology tool von LIU WEI, SASANO HIROKI, MUI DAVID S.L

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APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA von MENDIRATTA ARJUN, PENG GRANT, SRINIVASAN SATISH, PODLESNIK DRAGAN, KON SHIHUNG, ZHU JI, MUI DAVID S.L

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Mobility degradation in a quantum well heterostructure of GaAs/AlGaAs prototype von ARORA, V. K, MUI, D. S. L, MORKOC, H

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