Development of a low-cost autofocusing probe for profile measurement von Fan, Kuang-Chao, Chu, Chih-Liang, Mou, Jong-I

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Development of a multiple-microhole aerostatic air bearing system von Fan, Kuang-Chao, Ho, Chi-Chung, Mou, Jong-I

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Development of a high-precision straightness measuring system with DVD pick-up head von Fan, Kuang-Chao, Chu, Chih-Liang, Liao, Jarn-Lien, Mou, Jong-I

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A variable-resolution optical profile measurement system von Tsai, Tung-Hsien, Fan, Kuang-Chao, Mou, Jong-I

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Error analysis for a diffraction grating interferometric stylus probing system von Fan, Kuang-Chao, Su, Chung-De, Mou, Jong-I

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Nanoindentation and nanotribological behavior of Fe-N/Ti-N multilayers with different thickness of Fe-N layers von Lu, Xin-Chun, Shi, Bing, Li, Lawrence K.Y., Luo, Jianbin, Mou, Jong-I.

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Fault-tolerant heterarchical control of heterogeneous manufacturing system entities von Duffie, Neil A., Chitturi, Ramesh, Mou, Jong-I

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Nanoindentation and microtribological behavior of Fe–N/Ti–N multilayers with different thickness of Ti–N layers von Lu, Xin-Chun, Shi, Bing, Li, Lawrence K.Y., Luo, Jianbin, Chang, Xiangrong, Tian, Zhongzhuo, Mou, Jong-I

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Parallel Kinematic Machine Positioning Accuracy Assessment and Improvement von Song, Jing, Mou, Jong-I, King, Calvin

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Method and/or system for chemical mechanical planarization (CMP) von Tsen, Yen-Di, Mou, Jong-I, Yen-Wei, Cheng

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Computer-aided error modeling approach to improve the accuracy of turning processes von Mou, J.

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Nanoindentation and microtribological behavior of Fe-N/Ti-N multilayers with different thickness of Ti-N layers von LU, Xin-Chun, BING SHI, LI, Lawrence K. Y, JIANBIN LUO, XIANGRONG CHANG, ZHONGZHUO TIAN, MOU, Jong-I

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System and method of bump map determination and bump array formation von HSU, SHIH HSUAN, CHEN, PENG-REN, CHENG, WEN-HAO, CHENG, CHANUNG, LIU, CHUNN, MOU, JONG-I, CHEN, CHENG-HUNG

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Apparatus and method for chemical mechanical polishing process control von Hui, Keung, Sung, Jin-Ning, Tsen, Yen-Di, Huang, Soon-Kang, Mou, Jong-I

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Semiconductor fabrication component retuning von YEN-WEI CHENG, HUI KEUNG, MOU JONG-I

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Method and system for tool condition monitoring based on a simulated inline measurement von Ho, Chia-Tong, Mou, Jong-I, Wu, Sunny, Wang, Jo Fei, Lin, Chin-Hsiang, Tsai, Po-Feng

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Real-time calibration for wafer processing chamber lamp modules von Wu Sunny, Chang Chih-Tien, Lin Chin-Hsiang, Mou Jong-I, Wang Jo Fei

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SEMICONDUCTOR FABRICATION COMPONENT RETUNING von YEN-WEI CHENG, HUI KEUNG, MOU JONG-I

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System and method of dosage profile control von CHANG CHUN-LIN, HUI KEUNG, MOU JONG-I

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System and method for controlling ion implanter von Tsai Po-Feng, Lee Sheng-Wei, Liao Chia-Hsing, Mou Jong-I, Wang Jo-Fei, Ho Chia-Tong

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