Microstitching interferometry for x-ray reflective optics von Yamauchi, Kazuto, Yamamura, Kazuya, Mimura, Hidekazu, Sano, Yasuhisa, Saito, Akira, Ueno, Kazumasa, Endo, Katsuyoshi, Souvorov, Alexei, Yabashi, Makina, Tamasaku, Kenji, Ishikawa, Tetsuya, Mori, Yuzo

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Relative angle determinable stitching interferometry for hard x-ray reflective optics von Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Yamamura, Kazuya, Sano, Yasuhisa, Ueno, Kazumasa, Endo, Katsuyoshi, Mori, Yuzo, Yabashi, Makina, Tamasaku, Kenji, Nishino, Yoshinori, Ishikawa, Tetsuya, Yamauchi, Kazuto

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Development of plasma chemical vaporization machining von Mori, Yuzo, Yamauchi, Kazuto, Yamamura, Kazuya, Sano, Yasuhisa

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Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining von Yamamura, Kazuya, Yamauchi, Kazuto, Mimura, Hidekazu, Sano, Yasuhisa, Saito, Akira, Endo, Katsuyoshi, Souvorov, Alexei, Yabashi, Makina, Tamasaku, Kenji, Ishikawa, Tetsuya, Mori, Yuzo

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Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining von Sano, Yasuhisa, Yamamura, Kazuya, Mimura, Hidekazu, Yamauchi, Kazuto, Mori, Yuzo

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Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics von Yamauchi, Kazuto, Yamamura, Kazuya, Mimura, Hidekazu, Sano, Yasuhisa, Saito, Akira, Endo, Katsuyoshi, Souvorov, Alexei, Yabashi, Makina, Tamasaku, Kenji, Ishikawa, Tetsuya, Mori, Yuzo

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Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining von Mori, Yuzo, Yamamura, Kazuya, Sano, Yasuhisa

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Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors von Mimura, Hidekazu, Matsuyama, Satoshi, Yumoto, Hirokatsu, Hara, Hideyuki, Yamamura, Kazuya, Sano, Yasuhisa, Shibahara, Masafumi, Endo, Katsuyoshi, Mori, Yuzo, Nishino, Yoshinori, Tamasaku, Kenji, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto

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The study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining: Development of the machine for the x-ray mirror fabrication von Mori, Yuzo, Yamamura, Kazuya, Sano, Yasuhisa

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Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment von SHIMURA, Mari, SAITO, Akira, SANO, Yasuhisa, YABASHI, Makina, TAMASAKU, Kenji, NISHIO, Kazuto, NISHINO, Yoshinori, ENDO, Katsuyoshi, HATAKE, Kiyohiko, MORI, Yuzo, ISHIZAKA, Yukihito, ISHIKAWA, Tetsuya, MATSUYAMA, Satoshi, SAKUMA, Takahiro, TERUI, Yasuhito, UENO, Kazumasa, YUMOTO, Hirokatsu, YAMAUCHI, Kazuto, YAMAMURA, Kazuya, MIMURA, Hidekazu

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Highly resolved scanning tunneling microscopy study of Si(0 0 1) surfaces flattened in aqueous environment von Arima, Kenta, Kubota, Akihisa, Mimura, Hidekazu, Inagaki, Kouji, Endo, Katsuyoshi, Mori, Yuzo, Yamauchi, Kazuto

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Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining von Kubota, Akihisa, Mimura, Hidekazu, Inagaki, Kouji, Mori, Yuzo, Yamauchi, Kazuto

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Uniformalization of AT cut quartz crystal wafer thickness using open-air type plasma CVM process von Yamamura, Kazuya, Morikawa, Tetsuya, Shibahara, Masafumi, Zettsu, Nobuyuki, Mori, Yuzo

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Etching characteristics of GaN by plasma chemical vaporization machining von Nakahama, Yasuji, Kanetsuki, Norio, Funaki, Takeshi, Kadono, Masaru, Sano, Yasuhisa, Yamamura, Kazuya, Endo, Katsuyoshi, Mori, Yuzo

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Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining von Yamauchi, Kazuto, Yamamura, Kazuya, Mimura, Hidekazu, Sano, Yasuhisa, Saito, Akira, Endo, Katsuyoshi, Souvorov, Alexei, Yabashi, Makina, Tamasaku, Kenji, Ishikawa, Tetsuya, Mori, Yuzo

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Investigation of the surface removal process of silicon carbide in elastic emission machining von KUBOTA, Akihisa, SHINBAYASHI, Yohsuke, MIMURA, Hidekazu, SANO, Yasuhisa, INAGAKI, Kouji, MORI, Yuzo, YAMAUCHI, Kazuto

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Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining von Yamauchi, Kazuto, Mimura, Hidekazu, Inagaki, Kouji, Mori, Yuzo

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Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining von Shibahara, Masafumi, Yamamura, Kazuya, Sano, Yasuhisa, Sugiyama, Tsuyoshi, Endo, Katsuyoshi, Mori, Yuzo

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Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics von Mimura, Hidekazu, Yamauchi, Kazuto, Yamamura, Kazuya, Kubota, Akihisa, Matsuyama, Satoshi, Sano, Yasuhisa, Ueno, Kazumasa, Endo, Katsuyoshi, Nishino, Yoshinori, Tamasaku, Kenji, Yabashi, Makina, Ishikawa, Tetsuya, Mori, Yuzo

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Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning von Arima, Kenta, Endo, Katsuyoshi, Kataoka, Toshihiko, Oshikane, Yasushi, Inoue, Haruyuki, Mori, Yuzo

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