Model-based purge gas flow von PANDEY VISHWAS KUMAR, MORADIA ALLA, WASHINGTON LORI D, CHEN MIAOCHUN

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Temperature control apparatus in substrate processing chamber von PANDEY VISHWAS KUMAR, SOMMANNA, DINKESH, HUDLEY, MORADIA ALLA, XIAN, KARTIK, BHUPENDRA, DICKINSON COLIN JOHN

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CHAMBER BODY THROUGH FOR RESISTIVE HEATING ELEMENTS von BRIAN HAYES BURROWS, MORADIA ALLA, ZHU ZUOMING, CHIN KA CHENG

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Ecological benefit monitoring and exploration platform for semiconductor manufacturing von KOOL SHRIYASH SURESH, MORADIA ALLA, NEVILLE ELIZABETH, MEEROVICH SERGEY, KELKAR, UMESH, MADHAV, TREJO ORLANDO, SHAH KARTIK B

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Ecological efficiency (sustainability) instrument panel manufactured by semiconductor von KOSNOO, PRASHANTH, MORADIA ALLA, NEVILLE ELIZABETH, MEEROVICH SERGEY, KELKAR, UMESH, MADHAV, DENOME, MARK, R, SHAH KARTIK, RAMASWAMY, KARTIK, TREJO ORLANDO

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Chamber architecture for epitaxial deposition and advanced epitaxial film applications von SRINIVASAN SWAMINATHAN T, MORADIA ALLA, ISHIKAWA TETSUYA, XIAN, KARTIK, BHUPENDRA, RICE MICHAEL R, REIMER, PETER, SUBANNA, MANJUNATH, BAUER MATTHIAS

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Methods, systems, and apparatus for performing calibration operations of multiple mass flow controllers (mfcs) of substrate processing system von YE ZHIYUAN, MORADIA ALLA, LIU PATRICIA M, ZHU ZUOMING, RAJWAN, JYOTI, SANKARATHY, BINDUSAGA, MARA, SANCHEZ ERROL ANTONIO C

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Method and system for foreline deposition diagnosis and control von LIU MENGFU, MORADIA ALLA, ZHU ZUOMING, SRIVASTAVA SURENDRA SINGH, HILKENE MARTIN A, SANCHEZ ERROL ANTONIO C, SANKARATHONG BINDUSAGAR MALA

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In-situ temperature mapping for EPI chambers von YE ZHIYUAN, MORADIA ALLA, LIU PATRICIA M, ZHU ZUOMING, ZHU ENLE, LAU SHU-KWAN, CHANG FLORA FONG-SONG

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Gas injector for epitaxy and CVD chambers von SRINIVASAN SWAMINATHAN T, MORADIA ALLA, ZOKAI SAURABH, ISHIKAWA TETSUYA, XIAN, KARTIK, BHUPENDRA, SANCHEZ ERROL ANTONIO C, RICE MICHAEL R, REIMER, PETER, BAUER MATTHIAS, SUBANNA, MANJUNATH

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Parameter sensing and computer modeling for gas delivery health monitoring von RAMASWAMY KARTHIK, OH JEONGHOON, KERKAR UMESH MADHAV, PRABHU GOPALAKRISHNA B, SHENG SHURAN, MORADIA ALLA, MAHAKARI ROHIT, YUAN ZHENG, JAMES. OMAR. LECH, ZHANG LIN

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Hot batch processing chamber von PANDEY VISHWAS KUMAR, CHU SCHUBERT S, MORADIA ALLA, ZHU ZUOMING, RANGAPPA, SRINIVASA, CHIN CHIA CHENG, LAU SHU-KWAN, XIAN, KARTIK, BHUPENDRA, TANO ADEL GEORGES, KUMAR SURAJIT

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Epitaxial deposition chamber von YE ZHIYUAN, DUBEY, ABUSHEK, MORADIA ALLA, ZHU ENLE, WONG, DANNY, D, LAU SHU-KWAN, XIAN, KARTIK, BHUPENDRA, COLLINS RICHARD O, BURROWS, BRIAN HAYES, NAKAGAWA TOSHIYUKI, NELIKAR, SANEESH

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Wafer edge temperature correction in batch thermal processing chamber von PANDEY VISHWAS KUMAR, CHU SCHUBERT S, MORADIA ALLA, ZHU ZUOMING, RANGAPPA, SRINIVASA, MYO NYI O, LAU SHU-KWAN, XIAN, KARTIK, BHUPENDRA, TANO ADEL GEORGES, KUMAR SURAJIT, BURROWS, BRIAN HAYES

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Substrate processing monitoring von YE ZHIYUAN, SRIVASTAVA SURENDRA SINGH, ZHU ENLE, SHAPOSHNIKOV MAXIM D, CONG ZHEPENG, LAU SHU-KWAN, JAMPANA, BALAKRISHNAN, R, CHU SCHUBERT S, MORADIA ALLA, LIU PATRICIA M, ZHU ZUOMING, SANCHEZ ERROL C, CHANG FLORA FONG-SONG, SANKARATHY, BINDUSAGA, MARA, LIN JENNY C, NESTOROV, VIREN, K

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