Optical filter wavefront distortion: out-of-band to in-band predictions and the effect of the illumination source bandwidth von Carlow, Graham, Guay, Jean-Michel, Christou, Alex, Montcalm, Claude, Badeen, Adam, Sullivan, Brian T

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Effect of an optical coating on in-band and out-of-band transmitted and reflected wavefront error measurements von Carlow, Graham, Sullivan, Brian T, Montcalm, Claude, Miles, Alexander

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Design of X-ray multilayer mirrors with maximal integral efficiency von Kozhevnikov, Igor V., Montcalm, Claude

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Molybdenum-strontium multilayer mirrors for the 8-12-nm extreme-ultraviolet wavelength region von Sae-Lao, B, Montcalm, C

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Experimental study of Cr ∕ Sc multilayer mirrors for the nitrogen K α -emission line von Hardouin, Aurélie, Delmotte, Franck, Ravet, Marie Françoise, Bridou, Françoise, Jerome, Arnaud, Varniere, Françoise, Montcalm, Claude, Hedacq, Sébastien, Gullikson, Eric, Aubert, Pascal

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Performance of normal-incidence molybdenum-yttrium multilayer-coated diffraction grating at a wavelength of 9 nm von Sae-Lao, Benjawan, Bajt, Sasa, Montcalm, Claude, Seely, John F

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Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region von Montcalm, C, Kearney, P A, Slaughter, J M, Sullivan, B T, Chaker, M, Pépin, H, Falco, C M

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High-efficiency MoRu-Be multilayer-coated gratings operating near normal incidence in the 11.1-12.0-nm wavelength range von Seely, J F, Montcalm, C, Baker, S, Bajt, S

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Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system von Montcalm, Claude, Grabner, R Frederick, Hudyma, Russell M, Schmidt, Mark A, Spiller, Eberhard, Walton, Christopher C, Wedowski, Marco, Folta, James A

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Materials Science of Multilayer X-ray Mirrors von Ghafoor, Naureen

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Characterization of thin-film losses with a synchronously pumped ringdown cavity von Vaschenko, Georgiy, Godwal, Yogesh, Menoni, Carmen S, Montcalm, Claude, Blacker, Richard, Siegfried, Daniel

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Experimental study of Cr/Sc multilayer mirrors for the nitrogen K{sub {alpha}}-emission line von Hardouin, Aurelie, Delmotte, Franck, Ravet, Marie Francoise, Bridou, Francoise, Jerome, Arnaud, Varniere, Francoise, Montcalm, Claude, Hedacq, Sebastien, Gullikson, Eric, Aubert, Pascal, Laboratoire Charles Fabry de l'Institut d'Optique, CNRS, Universite Paris-Sud, Campus Polytechnique, RD128, 91127 Palaiseau cedex, Xenocs SA, 19 rue Francois Blumet, 38360 Sassenage, Lawrence Berkeley National Laboratory, Berkeley, California 94720, Laboratoire Multicouches Nanometriques, Universite d'Evry Val d'Essonne, Batiment Maupertuis, rue du Pere Jarlan-91025 Evry cedex

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Recovery of Multilayer-Coated Zerodur and ULE Optics for Extreme-Ultraviolet Lithography by Recoating, Reactive-Ion Etching, and Wet-Chemical Processes von Mirkarimi, P B, Baker, S L, Montcalm, C, Folta, J A

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In situ reflectance measurements of soft-x-ray/extreme-ultraviolet Mo/Y multilayer mirrors von Montcalm, C, Sullivan, B T, Duguay, S, Ranger, M, Steffens, W, Pépin, H, Chaker, M

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Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering von Montcalm, C, Sullivan, B T, Pépin, H, Dobrowolski, J A, Sutton, M

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Mo/Y multilayer mirrors for the 8-12-nm wavelength region von Montcalm, C, Sullivan, B T, Ranger, M, Slaughter, J M, Kearney, P A, Falco, C M, Chaker, M

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Mo/Y multilayer mirrors for the 8-12-nm wavelength region von Montcalm, C, Sullivan, B T, Ranger, M, Slaughter, J M, Kearney, P A, Falco, C M, Chaker, M

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Extreme-ultraviolet optical constant determination near an absorption edge von Sullivan, B T, Montcalm, C

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Process for fabricating high reflectance-low stress Mo-Si multilayer reflective coatings von MONTCALM CLAUDE, MIRKARIMI PAUL B

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Method of Deposition with Reduction of Contaminants in An Ion Assist Beam and Associated Apparatus von NTOVA PARASKEVI, MONTCALM CLAUDE, HOGHOJ PETER, RODRIGUES SERGIO

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