Compositional effects on radiation tolerance of amorphous silicon oxycarbide von Mizuguchi, Shoki, Inoue, Shinsuke, Ishimaru, Manabu, Su, Qing, Nastasi, Michael

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Dual-Beam Irradiation Stability of Amorphous Silicon Oxycarbide at 300°C and 500°C von Su, Qing, Greaves, Graeme, Donnelly, Stephen E., Mizuguchi, Shoki, Ishimaru, Manabu, Nastasi, Michael

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Compositional effects on radiation tolerance of amorphous silicon oxycarbide von Mizuguchi, Shoki, Inoue, Shinsuke, Ishimaru, Manabu, Su, Qing, Nastasi, Michael

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Dual-Beam Irradiation Stability of Amorphous Silicon Oxycarbide at 300C and 500C von Su, Qing, Greaves, Graeme, Donnelly, Stephen E, Mizuguchi, Shoki, Ishimaru, Manabu, Nastasi, Michael

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PM-04Relationship between amorphous structure and radiation tolerance of silicon oxycarbide von Mizuguchi, Shoki, Inoue, Shinsuke, Ishimaru, Manabu, Su, Qing, Nastasi, Michael

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Substrate processing method and substrate processing device von SAKURAI, HIROKI, MIZUGUCHI, SHOKI

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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE von SAKURAI, Hiroki, MIZUGUCHI, Shoki

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Nozzle, substrate processing apparatus, and substrate processing method von Mizuguchi, Shoki, Hsu, Yenrui, Mori, Kanta, Yada, Kenji, Ogata, Nobuhiro, Goto, Daisuke, Hashimoto, Yusuke, Sakurai, Hiroki

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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD von SAKURAI, Hiroki, UMENO, Shinichi, KIM, Minsung, HSU, Yenrui, MIZUGUCHI, Shoki, HIGASHI, Hiroyuki, OGATA, Nobuhiro, GODA, Kazuya

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NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD von SAKURAI, Hiroki, GOTO, Daisuke, YADA, Kenji, HASHIMOTO, Yusuke, HSU, Yenrui, MORI, Kanta, MIZUGUCHI, Shoki, OGATA, Nobuhiro

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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS von SAKURAI, Hiroki, GOTO, Daisuke, HASHIMOTO, Yusuke, HSU, Yenrui, MIZUGUCHI, Shoki, OGATA, Nobuhiro

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SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS von SAKURAI, Hiroki, GOTO, Daisuke, NAKAMURA, Kazunori, HIGASHIJIMA, Jiro, MORI, Kanta, MIZUGUCHI, Shoki, OGATA, Nobuhiro

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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD von HSU YENRUI, HIGASHI HIROYUKI, SAKURAI HIROKI, UMENO SHINICHI, MIZUGUCHI SHOKI, GODA KAZUYA, OGATA NOBUHIRO, KIM MINSUNG

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NOZZLE SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD von HSU YENRUI, SAKURAI HIROKI, MORI KANTA, MIZUGUCHI SHOKI, OGATA NOBUHIRO, HASHIMOTO YUSUKE, GOTO DAISUKE, YADA KENJI

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Substrate processing apparatus and substrate processing method von OGATA, NOBUHIRO, HSU, YEN-RUI, KIM, MIN-SUNG, HIGASHI, HIROYUKI, GODA, KAZUYA, SAKURAI, HIROKI, UMENO, SHINICHI, MIZUGUCHI, SHOKI

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Nozzle, substrate processing device, and substrate processing method von OGATA, NOBUHIRO, HSU, YEN-RUI, MORI, KANTA, HASHIMOTO, YUSUKE, YADA, KENJI, SAKURAI, HIROKI, GOTO, DAISUKE, MIZUGUCHI, SHOKI

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Substrate processing method and substrate processing device von OGATA, NOBUHIRO, HSU, YEN-RUI, HASHIMOTO, YUSUKE, SAKURAI, HIROKI, GOTO, DAISUKE, MIZUGUCHI, SHOKI

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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS von HSU YENRUI, SAKURAI HIROKI, MIZUGUCHI SHOKI, OGATA NOBUHIRO, HASHIMOTO YUSUKE, GOTO DAISUKE

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