Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes von Mizotani, Kohei, Isobe, Michiro, Hamaguchi, Satoshi

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Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation von Mizotani, Kohei, Isobe, Michiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi

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Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes von Ito, Tomoko, Karahashi, Kazuhiro, Mizotani, Kohei, Isobe, Michiro, Kang, Song-Yun, Honda, Masanobu, Hamaguchi, Satoshi

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Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams von MIZOTANI, Kohei, ISOBE, Michiro, KARAHASHI, Kazuhiro, HAMAGUCHI, Satoshi

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Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes von Ito, Tomoko, Karahashi, Kazuhiro, Mizotani, Kohei, Isobe, Michiro, Kang, Song-Yun, Honda, Masanobu, Hamaguchi, Satoshi

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30aAE-12 Numerical analyses of plasma-nanosurface interactions von Mizotani, Kohei, Isobe, Michiro, Hamaguchi, Satoshi

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Analyses of Ni sputtering by energetic ions from CO plasmas von Kumamoto, Akito, Mauchamp, Nicolas, Isobe, Michiro, Mizotani, Kohei, Li, Hu, Ito, Tomoko, Karahashi, Kazuhiro, Hamaguchi, Satoshi

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Effects of metal carbonyls formation during ferromagnetic metal etching processes von Mizotani, Kohei, Miyake, Keita, Isobe, Michiro, Karahashi, Kazuhiro, Hamaguchi, Satoshi

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30aAE-12 数値解析によるプラズマ・ナノ表面相互作用の評価(30aAE 非平衡極限プラズマ,領域2(プラズマ)) von 溝谷, 浩平, 礒部, 倫郎, 浜口, 智志

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一酸化炭素プラズマからのイオン照射によるニッケルスパッタリングの解析 von 熊本, 顕人, Nicolas, Mauchamp, 礒部, 倫郎, 溝谷, 浩平, 李, 虎, 伊藤, 智子, 唐橋, 一浩, 浜口, 智志

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ETCHING METHOD AND DEVICE von HAMAGUCHI TOMOSHI, MATSUO JIRO, MIZOTANI KOHEI, KARAHASHI KAZUHIRO, SEKI TOSHIO, KINOSHITA KEIZO

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強磁性体金属材料エッチングにおける金属カルボニル生成の効果 von 溝谷, 浩平, 三宅, 啓太, 礒部, 倫郎, 唐橋, 一浩, 浜口, 智志

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