Influence of crystal-originated particle microstructure on silicon wafers on gate oxide integrity von MIYAZAKI, M, MIYAZAKI, S, KITAMURA, T, YANASE, Y, OCHIAI, T, TSUYA, H

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Microstructure observation of crystal-originated particles on silicon wafers von MIYAZAKI, M, MIYAZAKI, S, YANASE, Y, OCHIAI, T, SHIGEMATSU, T

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Efficiency of boron gettering for iron impurities in p/p+epitaxial silicon wafers von MIYAZAKI, M, MIYAZAKI, S, OGUSHI, S, OCHIAI, T, SANO, M, SHIGEMATSU, T

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Influence of metal impurities on leakage current of Si N+P diode von MIYAZAKI, M, SANO, M, SUMITA, S, FUJINO, N

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Influence of Fe contamination in Czochralski-grown silicon single crystals on LSI-yield related crystal quality characteristics von MIYAZAKI, M, MIYAZAKI, S, KITAMURA, T, AOKI, T, NAKASHIMA, Y, HOURAI, M, SHIGEMATSU, T

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Comparison of gettering techniques by means of intentional quantitative Cu contamination von SANO, M, HORAI, M, MIYAZAKI, M, FUJINO, N, SHIRAIWA, T

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Dependence of Gettering Efficiency on Metal Impurities von Miyazaki, Morimasa, Sano, Masakazu, Sadamitsu, Shinsuke, Sumita, Shigeo, Fujino, Nobukatsu, Shiraiwa, Toshio

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SILICON WAFER HAVING GETTERING CAPABILITY, AND DEVICE MANUFACTURING METHOD von MIYAZAKI MORIMASA

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Method for evaluating quality of semiconductor substrate and method for manufacturing semiconductor substrate von MIYAZAKI MORIMASA

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Method for evaluating quality of semiconductor substrate and method for manufacturing semiconductor substrate von Miyazaki, Morimasa

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INDIRECT QUALITY EVALUATION METHOD FOR GETTERING LAYER FORMED ON WAFER BACKSIDE von MIYAZAKI MORIMASA

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SILICON WAFER CARRIER von MIYAZAKI MORIMASA

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METHOD FOR EVALUATING QUALITY OF SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE von MIYAZAKI MORIMASA

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Iron contamination in silicon wafers measured with the pulsed MOS capacitor generation lifetime technique von Suat-Eng Tan, Schroder, D.K., Kohno, M., Miyazaki, M.

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SEMICONDUCTOR SUBSTRATE QUALITY EVALUATING METHOD AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD von MIYAZAKI MORIMASA

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Analysis of capacitor breakdown mechanisms due to crystal-originated pits von Ono, T., Rozgonyi, G., Horie, H., Miyazaki, M., Tsuya, H.

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Quality evaluating method for semiconductor substrate and manufacturing method of semiconductor substrate von MIYAZAKI, MORIMASA

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PRODUCTION OF SILICON WAFER von MIYAZAKI MORIMASA

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ABRASIVE LIQUID FEED SYSTEM AND FEED METHOD FOR POLISHING SEMICONDUCTOR SUBSTRATE von MIYAZAKI MORIMASA

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MANUFACTURE OF MOS SEMICONDUCTOR DEVICE AND METAL MASK USED THEREFOR von MIYAZAKI MORIMASA

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