Visualizing the Relationship of Demand and Supply of IT Engineers in Japan Using e-CSTI Data Platform von MIYAMOTO, Iwao

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Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography von Taniguchi, Jun, Koga, Kentaro, Kogo, Yasuo, Miyamoto, Iwao

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Investigation of photoreaction mechanism of photosensitive glass by femtosecond laser von Hongo, Tomohiro, Sugioka, Koji, Niino, Hiroyuki, Cheng, Ya, Masuda, Masashi, Miyamoto, Iwao, Takai, Hiroshi, Midorikawa, Katsumi

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Nanosmoothing of single crystal diamond chips by 1 keV Ar + ion bombardment von Nagase, Takashi, Kato, Hiroyuki, Pahlovy, S. A., Miyamoto, Iwao

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Evaluation of surface roughness of ULE® substrates machined by Ar+ ion beam von Kurashima, Yuichi, Miyachi, Shuhei, Miyamoto, Iwao, Ando, Manabu, Numata, Atsushi

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Low energy Xe + ion beam machining of ULE® substrates for EUVL projection optics – Evaluation of high-spatial frequency roughness von Endo, Hironori, Inaba, Takuro, Pahlovy, Shahjada A., Miyamoto, Iwao

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Fabrication of Three-Dimensional Hydrogen Silsesquioxane Resist Structure using Electron Beam Lithography von Matsubara, Yasushi, Taniguchi, Jun, Miyamoto, Iwao

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Low Energy Xe + Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics von Endo, Hironori, Yamada, Junya, Pahlovy, Shahjada A., Miyamoto, Iwao

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Results of Survey on Educational Needs from Industries for Human Resources in Science and Technology von MIYAMOTO, Iwao

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Analysis on microstructure of interface layer in DLC/Si structures produced by FIB–CVD von Sakamoto, Naomichi, Kogo, Yasuo, Yasuno, Takuya, Taniguchi, Jun, Miyamoto, Iwao

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3D imprint technology using substrate voltage change von Taniguchi, Jun, Iida, Masamichi, Miyazawa, Takayuki, Miyamoto, Iwao, Shinoda, Kiyoshi

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Low energy ion beam machining of ULE ® substrates: Evaluation of surface roughness von Inaba, Takuro, Kurashima, Yuichi, Pahlovy, Shahjada A., Miyamoto, Iwao, Ando, Manabu, Numata, Atsushi

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Low Energy Xe+ Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics von Endo, Hironori, Yamada, Junya, Pahlovy, Shahjada A, Miyamoto, Iwao

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Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography von Jun Taniguchi, Jun Taniguchi, Yuji Tokano, Yuji Tokano, Iwao Miyamoto, Iwao Miyamoto, Masanori Komuro, Masanori Komuro, Hiroshi Hiroshima, Hiroshi Hiroshima, Kazuhiko Kobayashi, Kazuhiko Kobayashi, Takeshi Miyazaki, Takeshi Miyazaki, Hideyuki Ohyi, Hideyuki Ohyi

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Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology von Taniguchi, Jun, Kawasaki, Takeshi, Tokano, Yuji, Kogo, Yasuo, Miyamoto, Iwao, Komuro, Masanori, Hiroshima, Hiroshi, Sakai, Nobuji, Tada, Kentaro

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Thermal Desorption Development of Spin-On Glass for Electron Beam Nanolithography von Araki, Makoto, Taniguchi, Jun, Miyamoto, Iwao

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Fabrication of Ordered Blue Nanostructure by Anodization of an Aluminum Plate von Kurashima, Yuichi, Yokota, Yoshihiko, Miyamoto, Iwao, Itatani, Taro

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Fabrication of Ultrasmooth Mirrors by UV-Nanoimprint von Kurashima, Yuichi, Ito, Wakana, Miyamoto, Iwao, Ishii, Hiroyuki, Fujino, Hidetoshi, Itatani, Taro, Hiroshima, Hiroshi

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Depth control of a silicon structure fabricated by 100qkeV Ar ion beam lithography von Kawasegi, Noritaka, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Momota, Sadao, Taniguchi, Jun, Miyamoto, Iwao

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Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer von Hiroshima, Hiroshi, Inoue, Seiji, Kasahara, Nobuyuki, Taniguchi, Jun, Miyamoto, Iwao, Komuro, Masanori

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