A Strictly “Pair”-Selective Synthesis of Conjugated Diynes via Pd-Catalyzed Cross Coupling of 1,3-Diynylzincs:  A Superior Alternative to the Cadiot−Chodkiewicz Reaction von Negishi, Ei-ichi, Hata, Mitsuhiro, Xu, Caiding

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Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography von Hata, Mitsuhiro, Ryoo, Man-Hyoung, Choi, Sang-Jun, Cho, Han-Ku

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Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake von Hata, Mitsuhiro, Kim, Hyun-Woo, Yoon, Jin-Young, Ha, Jung-Hwan, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku

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Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography von Hah, Jung Hwan, Yoon, Jin-Young, Hata, Mitsuhiro, Kim, Sang Wook, Kim, Hyun-Woo, Woo, Sang-Gyoun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Ryu, Byoung-Il

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Revisiting [Mn(CO)3(η 5-n ido-7,8-C2B9H11)]-, the Dicarbollide Analogue of [(η 5-C5H5)Mn(CO)3]:  Reactivity Studies Leading to Boron Atom Functionalization von Hata, Mitsuhiro, Kautz, Jason A, Lu, Xiu Lian, McGrath, Thomas D, Stone, F. Gordon A

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Isolation of a New Nonaborane Cluster Form:  a rachno -B 9 H 11 ·(PPh 3 ) 2 von Hata, Mitsuhiro, Rath, Nigam P., Barton, Lawrence

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Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up von Hah, Jung Hwan, Mayya, Subramanya, Hata, Mitsuhiro, Jang, Yun-Kyeong, Kim, Hyun-Woo, Ryoo, Manhyoung, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

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Synthesis and Structure of a Dichromatetraborane Derivative [{(OC)4Cr}2(η4-H,H‘,H‘‘,H‘‘‘-BH2BH2·PMe2CH2PMe2)] von Hata, Mitsuhiro, Kawano, Yasuro, Shimoi, Mamoru

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Isolation of a New Nonaborane Cluster Form:  arachno-B9H11·(PPh3)2 von HATA, Mitsuhiro, RATH, Nigam P., BARTON, Lawrence

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Reactions of boranes and metallaboranes with phosphines von Barton, Lawrence, Volkov, Oleg, Hata, Mitsuhiro, McQuade, Paul, Rath, Nigam P.

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Chemical shrinkage material: Nanoscale patterning through interpolymer complex von Hata, Mitsuhiro, Hah, Jung-Hwan, Kim, Hyun-Woo, Ryoo, Man-Hyoung, Choi, Sang-Jun, Woo, Sang-Gyun, Cho, Han-Ku

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Photoresist composition von MASUYAMA TATSURO, HATA MITSUHIRO

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Compound and photoresist composition containing the same von MASUYAMA TATSURO, HATA MITSUHIRO

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THE KNEADING METHOD OF RUBBER von HATA MITSUHIRO

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PRODUCTION METHOD OF RESIST PATTERN von HATA MITSUHIRO, YASUE TAKAHIRO

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RESIST COMPOSITION von MASUYAMA TATSURO, HATA MITSUHIRO

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RESIST COMPOSITION von MASUYAMA TATSURO, HATA MITSUHIRO

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Polymer and chemically amplified resist composition comprising the same von FUJI YUSUKE, HATA MITSUHIRO

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Polymer and chemically amplified resist composition comprising the same von Fuji, Yusuke, Hata, Mitsuhiro

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CONVEYANCE CONVEYOR CONTROLLER AND CONVEYANCE CONVEYOR CONTROL METHOD von HATA MITSUHIRO

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