Inorganic Write-Once Disc for High Speed Recording von Inoue, Hiroyasu, Mishima, Kouji, Aoshima, Masaki, Hirata, Hideki, Kato, Tatsuya, Utsunomiya, Hajime

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Long-term influence of "bullying" received from intimate friends during upper elementary school grades: Focusing on retrospect of high school students von Mishima, Kouji

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Student Problems Referred for Guidance and Counseling, Cell Phone Regulations, and High School Students’ Dependence on Their Cell Phones: Questionnaire Results from High School Tea... von MISHIMA, KOUJI, KUROKAWA, MASAYUKI, ONISHI, AYAKO, YOSHITAKE, KUMI, HONJO, MASARU, HASHIMOTO, MASAYUKI, YOSHIDA, TOSHIKAZU

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Influence of the weight difference in the throwing technique of Judo to the head of Uke von Yoshihisa, ISHIKAWA, Kenji, ANATA, Hironori, HAYASHI, Takayuki, YOKOYAMA, Michito, SAKAMOTO, Hidekazu, SHOUDA, Kouji, MISHIMA, Shuichi, OKADA

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How Children Address Each Other in Class and in Peer Relations: Power Balance and Group Membership von MISHIMA, KOUJI

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Student Problems Referred for Guidance and Counseling, Cell Phone Regulations, and High School Students’ Dependence on Their Cell Phones: Questionnaire Results from High School Tea... von MISHIMA, KOUJI, KUROKAWA, MASAYUKI, ONISHI, AYAKO, YOSHITAKE, KUMI, HONJO, MASARU, HASHIMOTO, MASAYUKI, YOSHIDA, TOSHIKAZU

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Development of a scale of tolerance toward the opposite-sex in fifth- and sixth- graders von Kurokawa, Masayuki, Mishima, Kouji, Yoshida, Toshikazu

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Polishing agent, stock solution for polishing agent, and polishing method von Hanano, Masayuki, Mishima, Kouji, Watanabe, Naomi

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POLISHING AGENT, STOCK SOLUTION FOR POLISHING AGENT, AND POLISHING METHOD von MISHIMA, Kouji, HANANO, Masayuki, WATANABE, Naomi

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Bullying amongst close friends in elementary school von MISHIMA, Kouji

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Abrasive and substrate polishing method von MISHIMA KOUJI, TOBITA FUMIKO

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TWI804488B von MISHIMA, KOUJI, HANANO, MASAYUKI, WATANABE, NAOMI

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生徒指導上の問題発生頻度および携帯電話に対する規制と高校生の携帯電話依存傾向の関連: 高校教師・高校生を対象にした調査結果から... von 三島, 浩路, 黒川, 雅幸, 大西, 彩子, 吉武, 久美, 本庄, 勝, 橋本, 真幸, 吉田, 俊和

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CMP polishing solution and polishing method von Mishima, Kouji, Shimada, Tomokazu, Sakurada, Takafumi

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CMP polishing liquid and polishing method von Sakashita, Masahiro, Hanano, Masayuki, Mishima, Kouji, Watanabe, Naomi

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CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME von HANANO MASAYUKI, MISHIMA KOUJI, SAKASHITA MASAHIRO

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Polishing method von MISHIMA KOUJI, NISHIYAMA MASAYA, FUKASAWA MASATO

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CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME von HANANO MASAYUKI, MISHIMA KOUJI, SAKASHITA MASAHIRO

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Polishing agent and method of polishing substrate von MISHIMA, KOUJI, TOBITA, AYAKO

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CMP POLISHING LIQUID AND POLISHING METHOD von SAKASHITA Masahiro, WATANABE Naomi, HANANO Masayuki, MISHIMA Kouji

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