Subsurface damage from helium ions as a function of dose, beam energy, and dose rate von Livengood, Richard, Tan, Shida, Greenzweig, Yuval, Notte, John, McVey, Shawn

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Gas field ion source and liquid metal ion source charged particle material interaction study for semiconductor nanomachining applications von Tan, Shida, Livengood, Richard, Shima, Darryl, Notte, John, McVey, Shawn

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The neon gas field ion source—a first characterization of neon nanomachining properties von Livengood, Richard H., Tan, Shida, Hallstein, Roy, Notte, John, McVey, Shawn, Faridur Rahman, F.H.M.

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The Prospects of a Subnanometer Focused Neon Ion Beam von Rahman, F. H. M., McVey, Shawn, Farkas, Louis, Notte, John A., Tan, Shida, Livengood, Richard H.

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Defect Localization and Nanofabrication for Conductive Structures with Voltage Contrast in Helium Ion Microscopy von Xia, Deying, McVey, Shawn, Huynh, Chuong, Kuehn, Wilhelm

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An Introduction to the Helium Ion Microscope von Notte, John, Ward, Bill, Economou, Nick, Hill, Ray, Percival, Randy, Farkas, Lou, McVey, Shawn

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Rapid fabrication of solid-state nanopores with high reproducibility over a large area using a helium ion microscope von Xia, Deying, Huynh, Chuong, McVey, Shawn, Kobler, Aaron, Stern, Lewis, Yuan, Zhishan, Ling, Xinsheng Sean

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Passive Voltage Contrast Applications with Helium Ion Microscopy Imaging von Xia, Deying, McVey, Shawn, Huynh, Chuong, Kuehn, Wilhelm, Runt, Doug

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Rapid fabrication of solid-state nanopores with high reproducibility over a large area using a helium ion microscopeElectronic supplementary information (ESI) available. See DOI: 1... von Xia, Deying, Huynh, Chuong, McVey, Shawn, Kobler, Aaron, Stern, Lewis, Yuan, Zhishan, Ling, Xinsheng Sean

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Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis von Tan, Shida, Livengood, Richard, Hack, Paul, Hallstein, Roy, Shima, Darryl, Notte, John, McVey, Shawn

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Neon Ion Beam Lithography (NIBL) von Winston, Donald, Manfrinato, Vitor R, Nicaise, Samuel M, Cheong, Lin Lee, Duan, Huigao, Ferranti, David, Marshman, Jeff, McVey, Shawn, Stern, Lewis, Notte, John, Berggren, Karl K

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Imaging Contrast with Multiple Ion Beams von Wu, Huimeng, Sijbrandij, Sybren, McVey, Shawn, Notte, John

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Imaging Contrast with Multiple Ion Beams von Wu, Huimeng, Sijbrandij, Sybren, McVey, Shawn, Notte, John

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Understanding imaging modes in the helium ion microscope von Scipioni, Larry, Sanford, Colin A., Notte, John, Thompson, Bill, McVey, Shawn

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Neon Ion Beam Lithography (NIBL) von Winston, Donald, Manfrinato, Vitor R., Nicaise, Samuel M., Cheong, Lin Lee, Duan, Huigao, Ferranti, David, Marshman, Jeff, McVey, Shawn, Stern, Lewis, Notte, John, Berggren, Karl K.

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Advantages of Helium and Neon Ion Beams for Intelligent Imaging von Wu, Huimeng, Mcvey, Shawn, Ferranti, David, Huynh, Chuong, Notte, John, Stern, Lewis, Joens, Matthew S., Fitzpatrick, James A. J, Goetze, Bernhard

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IMPROVED EDITING OF DEEP, MULTI-LAYERED STRUCTURES von PARK, Chris, LEWIS, Brett, MORIN, Anthony, NOTTE, John, SULLIVAN, Neal, HUYNH, Chuong, MCVEY, Shawn

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Inspection system and inspection method to qualify semiconductor structures von Xia, Deying, Mantz, Ulrich, Kuehn, Wilhelm, McVey, Shawn, Lewis, Brett

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INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES von Xia, Deying, Mantz, Ulrich, Kuehn, Wilhelm, McVey, Shawn, Lewis, Brett

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INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES von LEWIS, Brett, MANTZ, Ulrich, KÜHN, Wilhelm, MCVEY, Shawn, XIA, Deying

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