Low-Resistance Titanium Contacts and Thermally Unstable Nickel Germanide Contacts on p-Type Germanium von Hao Yu, Schaekers, Marc, Schram, Tom, Aderhold, Wolfgang, Mayur, Abhilash J., Mitard, Jerome, Witters, Liesbeth, Barla, Kathy, Collaert, Nadine, Horiguchi, Naoto, Voon-Yew Thean, Aaron, De Meyer, Kristin

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Fin Doping by Hot Implant for 14nm FinFET Technology and Beyond von Wood, Bingxi Sun, Khaja, Fareen Adeni, Colombeau, Benjamin P, Sun, Shiyu, Waite, Andrew, Jin, Miao, Chen, Hao, Chan, Osbert, Thanigaivelan, Thirumal, Pradhan, Nilay, Gossmann, Hans-Joachim L, Sharma, Shashank, Chavva, Venkataramana R, Cai, Man-Ping, Okazaki, Motoya, Munnangi, Samuel Swaroop, Ni, Chi-Nung, Suen, Wesley, Chang, Chorng-Ping, Mayur, Abhilash, Variam, Naushad, Brand, Adam D

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Macroscopic and nanometer scale stress measurement of Ni(Pt)Si silicide: Impact of thermal treatments ranging from millisecond to several hours von Morin, Pierre Francois, Beneyton, Remi, Gregoire, Magali, Pofelski, Alexandre, Clement, Laurent, Muthukrishnan, Shankar, Mayur, Abhilash J.

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Low-Resistance Titanium Contacts and Thermally Unstable Nickel Germanide Contacts on p-Type Germanium von Yu, Hao, Schaekers, Marc, Schram, Tom, Aderhold, Wolfgang, Mayur, Abhilash J, Mitard, Jerome, Witters, Liesbeth, Barla, Kathy, Collaert, Nadine, Horiguchi, Naoto, Thean, Aaron Voon-Yew, De Meyer, Kristin

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Advanced Millisecond Annealing Approaches for High-k Metal Gate and Contact Scaling von Sharma, Shashank, Chen, Jaujiun, Ng, Ben, McIntosh, Robert C, Muthukrishnan, Shankar, Raman Sharma, Karthik, Graoui, Houda, Mayur, Abhilash

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Systems, methods, and apparatus for correcting thermal processing of substrates von Aderhold, Wolfgang R, Wang, Yi, Mayur, Abhilash J

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SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING OF SUBSTRATES von ADERHOLD, Wolfgang R, WANG, Yi, MAYUR, Abhilash J

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Optically transparent pedestal for fluidly supporting a substrate von Aderhold, Wolfgang R, Mayur, Abhilash J

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DENSE VERTICALLY SEGMENTED SILICON COATING FOR LOW DEFECTIVITY IN HIGH-TEMPERATURE RAPID THERMAL PROCESSING von JORGENSEN, David, WU, Jian, MAYUR, Abhilash J

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DENSE VERTICALLY SEGMENTED SILICON COATING FOR LOW DEFECTIVITY IN HIGH-TEMPERATURE RAPID THERMAL PROCESSING von JORGENSEN, David, WU, Jian, MAYUR, Abhilash J

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SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING OF SUBSTRATES von ADERHOLD, Wolfgang R, WANG, Yi, MAYUR, Abhilash J

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Rapid thermal processing chamber with linear control lamps von Rao, Preetham, Mayur, Abhilash J

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SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING OF SUBSTRATES von ADERHOLD, Wolfgang R, WANG, Yi, MAYUR, Abhilash J

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Angled implants for controlling gate–source/drain extension: A TCAD modeling study von Thirupapuliyur, Sunderraj, Al-Bayati, Amir, Jain, Amitabh, Mayur, Abhilash

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APPARATUS, METHODS, AND SYSTEMS OF USING HYDROGEN RADICALS FOR THERMAL ANNEALING von ZHANG, Xinming, LIU, Zhi, TAM, Norman L, MAYUR, Abhilash J

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APPARATUS, METHODS, AND SYSTEMS OF USING HYDROGEN RADICALS FOR THERMAL ANNEALING von ZHANG, Xinming, LIU, Zhi, TAM, Norman L, MAYUR, Abhilash J

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SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES von SPULLER, Matthew, ZHANG, Xinming, SHARMA, Shashank, TAM, Norman L, MAYUR, Abhilash J

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Catalyst enhanced molybdenum deposition and gap fill von Mayur, Abhilash, Wu, Kai, Cen, Xi, Ganguli, Seshadri, Zhang, Xinming, Tam, Norman L

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System and method for radical and thermal processing of substrates von Sharma, Shashank, Spuller, Matthew, Zhang, Xinming, Mayur, Abhilash J, Tam, Norman L

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TREATMENT METHODS FOR TITANIUM NITRIDE FILMS von SPULLER, Matthew, ZHANG, Xinming, SHARMA, Shashank, TAM, Norman, MAYUR, Abhilash

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