Films of hydrogenated silicon oxycarbonitride. Part I. Chemical and phase composition von Fainer, N. I., Plekhanov, A. G., Rumyantsev, Yu. M., Maximovskii, E. A., Shayapov, V. R.

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Use of hexamethylcyclotrisilazane for preparation of transparent films of complex compositions von Fainer, N. I., Golubenko, A. N., Rumyantsev, Yu. M., Maximovskii, E. A.

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Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane von Fainer, N. I., Golubenko, A. N., Rumyantsev, Yu. M., Kesler, V. G., Maximovskii, E. A., Ayupov, B. M., Kuznetsov, F. A.

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Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane von Kosinova, M. L., Rumyantsev, Yu. M., Chernyavskii, L. I., Nikulina, L. D., Kesler, V. G., Maximovskii, E. A., Fainer, N. I., Rakhlin, V. I., Voronkov, M. G., Kuznetsov, F. A.

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Thin silicon carbonitride films are perspective low- k materials von Fainer, N.I., Kosinova, M.L., Rumyantsev, Yu. M., Maximovskii, E.A., Kuznetsov, F.A.

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The investigation of properties of silicon nitride films obtained by RPECVD from hexamethyldisilazane von Fainer, N.I., Rumyantsev, Yu.M., Kosinova, M.L., Yurjev, G.S., Maximovskii, E.A., Kuznetsov, F.A.

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On the formation of the crystalline phases and nanostructure of silicon carbonitride layers grown on gallium arsenide substrates von Fainer, N. I., Kosyakov, V. I., Rumyantsev, Yu. M., Maximovskii, E. A.

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Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, N, Co) substrates von Fainer, N. I., Kosyakov, V. I., Rumyantsev, Yu. M., Maximovskii, E. A., Prokhorova, S. A., Gevko, P. N.

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Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy von Rumyantsev, Yu. M., Fainer, N. I., Maximovskii, E. A., Ayupov, B. M.

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Plasma-deposited CdS layers from (o-phen) bis (diethyldithiocarbamate) cadmium von Fainer, N.I, Rumyantsev, Yu.M, Salman, E.G, Kosinova, M.L, Yurjev, G.S, Sysoeva, N.P, Maximovskii, E.A, Sysoev, S.V, Golubenko, A.N

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Study of the structure of thin nanocrystalline films von Maximovskii, E. A., Fainer, N. I., Kosinova, M. L., Rumyantsev, Yu. M.

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Thin silicon carbonitride films are perspective low-k materials von FAINER, N. I, KOSINOVA, M. L, RUMYANTSEV, Yu. M, MAXIMOVSKII, E. A, KUZNETSOV, F. A

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The investigation of properties of silicon nitride films obtained by RPECVD from hexamethyldisilazane von FAINER, N. I, RUMYANTSEV, YU. M, KOSINOVA, M. L, YURJEV, G. S, MAXIMOVSKII, E. A, KUZNETSOV, F. A

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Study of Cu diffusion behavior in carbon rich SiCN:H films deposited from trimethylphenylsilane von Ermakova, E., Mogilnikov, K., Rumyantsev, Yu, Kichay, V., Maximovskii, E., Semenova, O., Kosinova, M.

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