Processing uniformity improvement by magnetic field distribution control in electron cyclotron resonance plasma chamber von NISHIMURA, H, KIUCHI, M, MATSUO, S

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Low temperature chemical vapor deposition method utilizing an electron cyclotron resonance plasma von MATSUO, S, KIUCHI, M

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Behavior of reaction products of poly-Si in electron cyclotron resonance ion stream etching and its application to stable and high-selectivity etching von TAKAHASHI, C, MATSUO, S

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Tantalum and tantalum nitride films deposited by electron cyclotron resonance sputtering as barriers to copper diffusion von Ono, Toshiro, Amazawa, Takao, Nishimura, Hiroshi, Matsuo, Seitaro

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Evaluation of the electron cyclotron resonance plasma process using a microwave twin-lead line probe von NISHIMURA, H, MATSUO, S

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Generation of Electron Cyclotron Resonance Neutral Stream and Its Application to Si Etching von Tsuchizawa, Tai, Yoshito Jin, Yoshito Jin, Seitaro Matsuo, Seitaro Matsuo

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Influence of Reaction Products and Oxygen on Highly Selective Electron Cyclotron Resonance Ion Stream Etching of Si von Tsuchizawa, Tai, Chiharu Takahashi, Chiharu Takahashi, Seitaro Matsuo, Seitaro Matsuo

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Wave propagation in a cylindrical electron cyclotron resonance plasma chamber von WATANABE, I, NISHIMURA, H, MATSUO, S

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Neutral stream extraction from electron cyclotron resonance plasma by using parallel magnetic field von JIN, Y, TSUCHIZAWA, T, MATSUO, S

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Optical image simulator using the real-space expression of the object pattern and a differential operator for optical proximity effect estimation von HARADA, K, TAKEUCHI, Y, HORIUCHI, T, MATSUO, S

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Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source von Matsuo, Seitaro, Adachi, Yoshio

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Electron cyclotron resonance plasma deposition technique using raw material supply by sputtering von ONO, T, TAKAHASHI, C, MATSUO, S

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Patterning Characteristics of Oblique Illumination Optical Lithography von Horiuchi, Toshiyuki, Takeuchi, Yoshinobu, Tamechika, Emi, Mimura, Yoshiaki, Seitaro Matsuo, Seitaro Matsuo, Katsuhiro Harada, Katsuhiro Harada

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Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasma von Matsuo, Seitaro

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Etching Characteristics of Various Materials by Plasma Reactive Sputter Etching von Matsuo, Seitaro

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Resolution enhancement by oblique illumination optical lithography using a transmittance-adjusted pupil filter von HORIUCHI, T, HARADA, K, MATSUO, S, TAKEUCHI, Y, TAMECHIKA, E, MIMURA, Y

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Small surface damage facet coating on InGaAsP/InP laser by ECR plasma deposition von WAKITA, K, MATSUO, S

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An Analytical Treatment on the Pattern Formation Process by Sputter Etching with a Mask von Matsuo, Seitaro

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Planar interconnection technology for LSI fabrication utilizing lift-off process von EHARA, K, MORIMOTO, T, MURAMOTO, S, MATSUO, S

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Ultrathin oxide films deposited using electron cyclotron resonance sputter von Amazawa, Takao, Ono, Toshiro, Shimada, Masaru, Matsuo, Seitaro, Oikawa, Hideo

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