Extendibility Study of Conventional IPA Drying Process From Dynamic Fluid Model for Pattern Collapse von Otsuji, Masayuki, Tanaka, Takayoshi, Iwasaki, Akihisa, Takahashi, Hiroaki, Okuno, Yasutoshi

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Deuterium Isotopic Effect on Nanometer-Sized Narrow Spaces Formed by Silicon Walls von Miyagawa, Shohei, Otsuji, Masayuki, Takeda, Takuma, Harumoto, Akiko, Ueda, Dai, Sawada, Koichi

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Breakthrough of Sublimation Drying by Liquid Phase Deposition von Fujiwara, Naozumi, Kato, Masahiko, Sasaki, Yuta, Hanawa, Yousuke, Yamaguchi, Yu, Takahashi, Hiroaki, Otsuji, Masayuki

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Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces von Fukami, Kazuhiro, Fujiwara, Naozumi, Ueda, Dai, Hanawa, Yousuke, Kitagawa, Hiroaki, Takahashi, Hiroaki, Otsuji, Masayuki

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Crystalline structures, surface morphology, and ferroelectric response in ultrathin film of vinylidene fluoride and trifluoroethylene copolymer von Tsutsumi, Naoto, Otsuji, Masayuki

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Method of restoring collapsed pattern, substrate processing method, and substrate processing device von Otsuji, Masayuki

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Substrate processing apparatus and substrate processing method von Otsuji, Masayuki

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METHOD OF RESTORING COLLAPSED PATTERN, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING DEVICE von OTSUJI, Masayuki

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Method of restoring collapsed pattern, substrate processing method, and substrate processing device von Otsuji, Masayuki

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METHOD OF RESTORING COLLAPSED PATTERN, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING DEVICE von OTSUJI, Masayuki

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Sacrificial film forming method, substrate treatment method, and substrate treatment device von Otsuji, Masayuki

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Substrate processing method von Otsuji, Masayuki

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Substrate processing method and substrate processing apparatus von Otsuji, Masayuki

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Oxygen Control Challenge for Advanced Wet Processing von Yoshida, Yukifumi, Otsuji, Masayuki, Takahashi, H., Snow, Jim, Sebaai, Farid, Holsteyns, Frank, Mertens, Paul W., Sato, Masanobu, Shirakawa, Hajime, Uchida, H.

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Substrate processing apparatus and substrate processing method von Otsuji, Masayuki

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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD von OTSUJI, Masayuki

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Wet Etching Behavior of Poly-Si in TMAH Solution von Takahashi, Hiroaki, Sato, Masanobu, Arai, Kenichiro, Nadahara, Soichi, Otsuji, Masayuki, Snow, Jim, Sebaai, Farid

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Substrate processing apparatus and substrate processing method von Otsuji, Masayuki

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SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD von OTSUJI MASAYUKI

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SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD von OTSUJI MASAYUKI

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