Universal Dependencies von de Marneffe, Marie-Catherine, Manning, Christopher D., Nivre, Joakim, Zeman, Daniel

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Investigating Reasons for Disagreement in Natural Language Inference von Jiang, Nan-Jiang, Marneffe, Marie-Catherine de

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Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C von Chanson, R., Zhang, L., Naumov, S., Mankelevich, Yu. A., Tillocher, T., Lefaucheux, P., Dussart, R., Gendt, S. De, Marneffe, J.-F. de

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Plasma processing of low-k dielectrics von Baklanov, Mikhail R., de Marneffe, Jean-Francois, Shamiryan, Denis, Urbanowicz, Adam M., Shi, Hualiang, Rakhimova, Tatyana V., Huang, Huai, Ho, Paul S.

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Damage free integration of ultralow-k dielectrics by template replacement approach von Zhang, L., de Marneffe, J.-F., Heylen, N., Murdoch, G., Tokei, Z., Boemmels, J., De Gendt, S., Baklanov, M. R.

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Novel Low Thermal Budget CMOS RMG: Performance and Reliability Benchmark Against Conventional High Thermal Budget Gate Stack Solutions von Franco, J., Arimura, H., de Marneffe, J.-F., Brus, S., Ritzenthaler, R., Croes, K., Kaczer, B., Horiguchi, Naoto

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Examining the acceptance of an integrated Electronic Health Records system: Insights from a repeated cross-sectional design von Luyten, Janis, Marneffe, Wim

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Characterization and Advanced Modeling of Dielectric Defects in Low-Thermal Budget RMG MOSFETs Using 1/f Noise Analysis von Asanovski, R., Arimura, H., de Marneffe, J.-F., Palestri, P., Horiguchi, N., Kaczer, B., Selmi, L., Franco, J.

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Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer von Marneffe, Jean-François de, Chan, Boon Teik, Spieser, Martin, Vereecke, Guy, Naumov, Sergej, Vanhaeren, Danielle, Wolf, Heiko, Knoll, Armin W.

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Plasma nitridation for atomic layer etching of Ni von Smith, Taylor G., Ali, Ali M., de Marneffe, Jean-François, Chang, Jane P.

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Identification of region-specific astrocyte subtypes at single cell resolution von Batiuk, Mykhailo Y., Martirosyan, Araks, Wahis, Jérôme, de Vin, Filip, Marneffe, Catherine, Kusserow, Carola, Koeppen, Jordan, Viana, João Filipe, Oliveira, João Filipe, Voet, Thierry, Ponting, Chris P., Belgard, T. Grant, Holt, Matthew G.

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Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics von de Marneffe, J.-F., Zhang, L., Heyne, M., Lukaszewicz, M., Porter, S. B., Vajda, F., Rutigliani, V., el Otell, Z., Krishtab, M., Goodyear, A., Cooke, M., Verdonck, P., Baklanov, M. R.

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Did It Happen? The Pragmatic Complexity of Veridicality Assessment von de Marneffe, Marie-Catherine, Manning, Christopher D., Potts, Christopher

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Plasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues von Krishtab, M., de Marneffe, J.-F., De Gendt, S., Baklanov, M. R.

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Vibration damping with negative capacitance shunts: theory and experiment von de Marneffe, B, Preumont, A

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Measuring red tape in a hospital setting: A survey experiment von Luyten, Janis, Marneffe, Wim

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He Thinks He Knows Better than the Doctors: BERT for Event Factuality Fails on Pragmatics von Jiang, Nanjiang, de Marneffe, Marie-Catherine

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Mechanisms for plasma cryogenic etching of porous materials von Zhang, Quan-Zhi, Tinck, Stefan, de Marneffe, Jean-François, Zhang, Liping, Bogaerts, Annemie

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The impact of regulatory quality and corruption on residential electricity prices in the context of electricity market reforms von Kaller, Alexander, Bielen, Samantha, Marneffe, Wim

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Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers von Marinov, Daniil, de Marneffe, Jean-François, Smets, Quentin, Arutchelvan, Goutham, Bal, Kristof M., Voronina, Ekaterina, Rakhimova, Tatyana, Mankelevich, Yuri, El Kazzi, Salim, Nalin Mehta, Ankit, Wyndaele, Pieter-Jan, Heyne, Markus Hartmut, Zhang, Jianran, With, Patrick C., Banerjee, Sreetama, Neyts, Erik C., Asselberghs, Inge, Lin, Dennis, De Gendt, Stefan

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