Thio Sol-Gel Process for the Synthesis of Titanium Disulfide von Sriram, Mandyam A., Kumta, Prashant N.

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New Molecular Precursors from the Reaction of Hydrazine and Aluminum Alkoxide for the Synthesis of Powders in the Al−O−N System von Kim, Jin Yong, Sriram, Mandyam A, McMichael, Paul H, Kumta, Prashant N, Phillips, Brian L, Risbud, Subhash H

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PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS von Subramonium, Pramod, van Schravendijk, Bart J, Sriram, Mandyam A, Petraglia, Jennifer L, Niu, Dong, Antonelli, George Andrew, Breiling, Patrick G, Alexy, John B, Womack, Joseph L, Haverkamp, Jason Dirk, Fox, Keith

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The thio-sol-gel synthesis of titanium disulfide and niobium disulfide. Part 1.: Materials chemistry von SRIRAM, M. A, KUMTA, P. N

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The thio-sol-gel synthesis of titanium disulfide and niobium disulfide von Sriram, Mandyam A., Kumta, Prashant N.

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The thio-sol-gel synthesis of titanium disulfide and niobium disulfide von Sriram, Mandyam A., Kumta, Prashant N.

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New molecular routes for synthesizing titanium disulfide von Sriram, Mandyam A., Kumta, Prashant N.

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PECVD apparatus for in-situ deposition of film stacks von Subramonium, Pramod, van Schravendijk, Bart J, Sriram, Mandyam A, Petraglia, Jennifer L, Niu, Dong, Antonelli, George Andrew, Breiling, Patrick G, Alexy, John B, Womack, Joseph L, Haverkamp, Jason Dirk, Fox, Keith

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The thio-sol-gel synthesis of titanium disulfide and niobium disulfide. Part 2. : Morphology, defect structure and electrochemical characteristics of titanium disulfide von SRIRAM, M. A, KUMTA, P. N

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Ambient gas treatment of porous dielectric von O'LOUGHLIN JENNIFER, SRIRAM MANDYAM A

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Ambient gas treatment of porous dielectric von Sriram, Mandyam A, O'Loughlin, Jennifer

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Ambient gas treatment of porous dielectric von O'LOUGHLIN JENNIFER, SRIRAM MANDYAM A

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IN-SITU DEPOSITION OF FILM STACKS von WOMACK JOSEPH L, FOX KEITH, SUBRAMONIUM PRAMOD, ALEXY JOHN B, HAVERKAMP JASON DIRK, PETRAGLIA JENNIFER L, NIU DONG, SRIRAM MANDYAM A, BREILING PATRICK G, ANTONELLI GEORGE ANDREW, VAN SCHRAVENDIJK BART J

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Novel chemical composition to reduce defects von CASTILLO-MEJIA DANILO, ANDRYUSHCHENKO TATYANA N, BUEHLER MARK F, SRIRAM MANDYAM A

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Deposition apparatus for providing uniform low-K dielectric von MCFADDEN ROBERT S.,LIANG SHURONG,KASPEROVICH VITALY G.,SRIRAM MANDYAM A

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DEPOSITION APPARATUS FOR PROVIDING UNIFORM LOW-K DIELECTRIC von SRIRAM, MANDYAM, A, LIANG, SHURONG, MCFADDEN, ROBERT, S, KASPEROVICH, VITALY, G

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DEPOSITION APPARATUS FOR PROVIDING UNIFORM LOW-K DIELECTRIC von SRIRAM, MANDYAM, A, LIANG, SHURONG, MCFADDEN, ROBERT, S, KASPEROVICH, VITALY, G

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Deposition apparatus for providing uniform low-k dielectric von MCFADDEN ROBERT S, KASPEROVICH VITALY G, LIANG SHURONG, SRIRAM MANDYAM A

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LITHIATED METAL OXIDES von SRIRAM, MANDYAM, A, WAGHRAY, AKSHAY, KUMTA, PRASHANT, N

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Lithiated metal oxides von MANDYAM A. SRIRAM, PRASHANT N. KUMTA, AKSHAY WAGHRAY

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