Creation and Development of the Ion Beam Technology von Maishev, Yu. P.

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Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics von Kudrya, V. P., Maishev, Yu. P.

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Installation for etching and deposition of thin-film structures by a fast neutral particle beam von Maishev, Yu. P., Shevchuk, S. L., Terent’ev, Yu. P.

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Calculation of the flow capacity of a gas channel in the sources of beams of fast neutral particles by means of the Monte-Carlo method von Kudrya, V. P., Maishev, Yu. P.

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Generation of fast neutral beams based on closed drift ion sources von Maishev, Yu. P., Shevchuk, S. L., Kudrya, V. P.

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Investigation into the selectivity of etching various materials by fast neutral particle beams von Maishev, Yu. P., Shevchuk, S. L., Kudrya, V. P.

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Silicon oxycarbide thin films deposited from viniltrimethoxysilane ion beams von Shevchuk, S.L., Maishev, Yu.P.

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Mathematical simulation of the influence of a focusing channel surface on the angle characteristics of a bundle of rapid neutral particles von Degtyarev, A. V., Kudrya, V. P., Maishev, Yu. P.

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Mathematical simulation of an inclined neutralization channel for a plasma source of neutral beams von Degtyarev, A. V., Kudrya, V. P., Maishev, Yu. P.

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A system for precision reactive ion-beam etching of nanostructures for field-emission devices von Maishev, Yu. P., Terent’ev, Yu. P., Shevchuk, S. L., Tatarenko, N. I., Golikov, V. A.

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The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Features of resist-free formation of masking pattern by electron beam-induced vapor deposition von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Silicon oxycarbide thin films deposited from viniltrimethoxysilane ion beams von SHEVCHUK, S. L, MAISHEV, Yu. P

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Formation of masking pattern by electron beam-induced vapor deposition von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Investigations of diamond-like carbon films produced directly from an ion beam of industrial ion source with a cold cathode von Enisherlova, K.L., Kontsevoi, Yu.A., Chervyakova, E.N., Mitrofanov, E.A., Maishev, Yu.P.

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