Treffer 1 - 13 von 13 für Suche 'MACHIA KEITH J', Suchdauer: 0,64s Treffer weiter einschränken
  1. 1
    Self-aligned emitter-base bipolar junction transistor with reduced base resistance and base-collector capacitance

    Self-aligned emitter-base bipolar junction transistor with reduced base resistance and base-collector capacitance von Harame David L, Machia Keith J, Alperstein Deborah A, Liu Qizhi, Willets Christa R, Joseph Alvin J

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  2. 2
    SELF-ALIGNED EMITTER-BASE BIPOLAR JUNCTION TRANSISTOR WITH REDUCED BASE RESISTANCE AND BASE-COLLECTOR CAPACITANCE

    SELF-ALIGNED EMITTER-BASE BIPOLAR JUNCTION TRANSISTOR WITH REDUCED BASE RESISTANCE AND BASE-COLLECTOR CAPACITANCE von MACHIA KEITH J, HARAME DAVID L, ALPERSTEIN DEBORAH A, WILLETS CHRISTA R, JOSEPH ALVIN J, LIU QIZHI

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  3. 3
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von MACHIA KEITH J, PARRISH CHARLES J, SCHNEIDER CRAIG E, NICHOLLS MATTHEW C, WHITING CHARLES A

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  4. 4
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von Machia, Keith J, Nicholls, Matthew C, Parrish, Charles J, Schneider, Craig E, Whiting, Charles A

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  5. 5
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von MACHIA KEITH J, PARRISH CHARLES J, SCHNEIDER CRAIG E, NICHOLLS MATTHEW C, WHITING CHARLES A

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  6. 6
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von MACHIA KEITH J, PARRISH CHARLES J, SCHNEIDER CRAIG E, NICHOLLS MATTHEW C, WHITING CHARLES A

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  7. 7
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von Machia, Keith J, Nicholls, Matthew C, Parrish, Charles J, Schneider, Craig E, Whiting, Charles A

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  8. 8
    Method of photolithographic exposure dose control as a function of resist sensitivity

    Method of photolithographic exposure dose control as a function of resist sensitivity von MACHIA KEITH J, PARRISH CHARLES J, SCHNEIDER CRAIG E, NICHOLLS MATTHEW C, WHITING CHARLES A

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  9. 9
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, SUNDLING DIANNE L, BOWLEY, JR. REGINALD R, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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  10. 10
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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  11. 11
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, SUNDLING DIANNE L, BOWLEY, JR. REGINALD R, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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  12. 12
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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  13. 13
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, BOWLEY REGINALD R, SUNDLING DIANNE L, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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