Implications of CO2 Contamination in Rechargeable Nonaqueous Li–O2 Batteries von Gowda, S. R, Brunet, A, Wallraff, G. M, McCloskey, B. D

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Lithographic Imaging Techniques for the Formation of Nanoscopic Features von Wallraff, G. M, Hinsberg, W. D

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Fluoropolymers for 157/193 nm Lithography: Chemistry, New Platform, Formulation Strategy, and Lithographic Evaluation von Ito, H., Truong, H. D., Okazaki, M., Miller, D. C., Fender, N., Brock, P. J., Wallraff, G. M., Larson, C. E., Allen, R. D.

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Spectroscopic characterization of piezochromism in poly(alkylsilanes): poly(di-n-hexylsilane) von Song, K, Kuzmany, H, Wallraff, G. M, Miller, R. D, Rabolt, J. F

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Solution photochemistry of poly(dialkylsilanes): a new class of photoresists von Michl, J., Downing, J. W., Karatsu, T., McKinley, A. J., Poggi, G., Wallraff, G. M., Sooriyakumaran, R., Miller, R. D.

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Studies of chain conformational kinetics in poly(di-n-alkylsilanes). 5. The effect of side-chain structure on piezochromism von Song, K, Miller, R. D, Wallraff, G. M, Rabolt, J. F

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Resolution of the nuclear and electronic contributions to the optical nonlinearity in polysilanes von MCGRAW, D. J, SEIGMAN, A. E, WALLRAFF, G. M, MILLER, R. D

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Novel Fluoropolymers for Use in 157nm Lithography von Ito, H., Wallraff, G. M., Fender, N., Brock, P. J., Larson, C. E., Truong, H. D., Breyta, G., Miller, D. C., Sherwood, M. H., Allen, R. D.

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The electronic structure of high molecular weight substituted silane polymers in solution: Fluorescence quenching studies von Miller, R. D., Baier, M., Diaz, A. F., Ginsburg, E. J., Wallraff, G. M.

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Implications of CO 2 Contamination in Rechargeable Nonaqueous Li–O 2 Batteries von Gowda, S. R., Brunet, A., Wallraff, G. M., McCloskey, B. D.

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Electro-oxidation of some soluble alkyl and aryl substituted polysilane homopolymers von DIAZ, A. F, BAIER, M, WALLRAFF, G. M, MILLER, R. D, NELSON, J, PIETRO, W

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Development of 157 nm positive resists von Ito, H., Wallraff, G. M., Fender, N., Brock, P. J., Hinsberg, W. D., Mahorowala, A., Larson, C. E., Truong, H. D., Breyta, G., Allen, R. D.

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Stable and Efficient Fluorescent Red and Green Dyes for External and Internal Conversion of Blue OLED Emission von Swanson, Sally A, Wallraff, Greg M, Chen, Jian P, Zhang, Weijie, Bozano, Luisa D, Carter, Kenneth R, Salem, Jesse R, Villa, Reymundo, Scott, J. Campbell

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Lithographic Techniques for the Fabrication of Oligonucleotide Arrays von Wallraff, G.M., Hinsberg, W.D., Brock, P.J., McGall, G.

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Progress in 193 nm Positive Resists von ALLEN, R. D., SOORIYAKUMARAN, R., OPITZ, J., WALLRAFF, G. M., BREYTA, G., DIPIETRO, R. A., HOFER, D. C., KUNZ, R. R., OKOROANYANWU, U., WILLSON, C. G.

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Conformational transition studies of organosilane polymers by light and neutron scattering von Shukla, Premal, Cotts, Patricia M, Miller, Robert D, Russell, Thomas P, Smith, Barton A, Wallraff, Greg M, Baier, Mark, Thiyagarajan, P

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Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems von Wallraff, G. M., Larson, C. E., Sooriyakumaran, R., Opitz, J., Fenzel-Alexander, D., DiPietro, R., Hofer, D., Breyta, G., Sherwood, M., Muete, J., Lin, Q., LaTulip, D., Simons, J., Babich, K., Petrillo, K., Angelopoulos, M.

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Solution photochemistry of poly(di-n-alkylsilane)s. An EPR-ENDOR study of the structure of the persistent radicals von MCKINLEY, A. J, KARATSU, T, WALLRAFF, G. M, THOMPSON, D. P, MILLER, R. D, MICHL, J

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Photodegradation of poly(dialkylsilane)s in solution: the persistent radicals have an unexpected structure von McKinley, Allan J, Karatsu, Takashi, Wallraff, Gregory M, Miller, Robert D, Sooriyakumaran, Ratnasabapathy, Michl, Josef

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POLYSILANE PHOTORESISTS FOR 193 AND 248 NM LITHOGRAPHY von Wallraff, G. M., Miller, R. D., Baier, M., Ginsburg, E. J., Kunz, R.R.

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