Molecular Glass Resists as High-Resolution Patterning Materials von De Silva, Anuja, Felix, Nelson M., Ober, Christopher K.

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Patterning Material Challenges for Improving EUV Stochastics von Silva, Anuja De, Meli, Luciana, Guo, Jing, Dutta, Ashim, Goldfarb, Dario L., Church, Jennifer, Felix, Nelson M.

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Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography von De Silva, Anuja, Lee, Jin-Kyun, André, Xavier, Felix, Nelson M, Cao, Heidi B, Deng, Hai, Ober, Christopher K

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Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing von Felix, Nelson M., De Silva, Anuja, Ober, Christopher K.

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Fluorinated Quaternary Ammonium Salts as Dissolution Aids for Polar Polymers in Environmentally Benign Supercritical Carbon Dioxide von Tanaka, Manabu, Rastogi, Abhinav, Toepperwein, Gregory N, Riggleman, Robert A, Felix, Nelson M, de Pablo, Juan J, Ober, Christopher K

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Lithography Based on Molecular Glasses von Tsuchiya, Kousuke, Chang, Seung Wook, Felix, Nelson M., Ueda, Mitsuru, Ober, Christopher K.

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Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2 von FELIX, Nelson M, DE SILV, Anuja, LUK, Camille Man Yin, OBER, Christopher K

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Supercritical Carbon Dioxide Compatible Salts: Synthesis and Application to Next Generation Lithography von Tanaka, Manabu, Rastogi, Abhinav, Felix, Nelson M., Ober, Chrisopher

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Towards environmentally friendly, dry deposited, water developable molecular glass photoresists von PFEIFFER, Frauke, FELIX, Nelson M, NEUBER, Christian, OBER, Christopher K, SCHMIDT, Hans-Werner

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Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor deposition von Mao, Yu, Felix, Nelson M., Nguyen, Peter T., Ober, Christopher K., Gleason, Karen K.

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Positive- and Negative-Tone CVD Polyacrylic Electron-Beam Resists Developable by Supercritical CO2 von Mao, Y., Felix, N. M., Nguyen, P. T., Ober, C. K., Gleason, K. K.

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Study of alternate hardmasks for extreme ultraviolet patterning von De Silva, Anuja, Seshadri, Indira, Arceo, Abraham, Petrillo, Karen, Meli, Luciana, Mendoza, Brock, Yao, Yiping, Belyansky, Michael, Halle, Scott, Felix, Nelson M.

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Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator von VANDERHART, David L, PRABHU, Vivek M, DE SILVA, Anuja, FELIX, Nelson M, OBER, Christopher K

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High-Resolution Patterning of Molecular Glasses Using Supercritical Carbon Dioxide von Felix, N. M., Tsuchiya, K., Ober, C. K.

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Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning von Pfeiffer, F., Felix, N. M., Neuber, C., Ober, C. K., Schmidt, H.-W.

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Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO 2 Processing von Felix, Nelson M., De Silva, Anuja, Ober, Christopher K.

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Supercritical Carbon Dioxide Compatible Salts von Tanaka, Manabu, Rastogi, Abhinav, M. Felix, Nelson, Ober, Chrisopher

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ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION von Felix, Nelson M, Mignot, Yann A.M, Liu, Chi-Chun, Burns, Sean D, Sieg, Stuart A

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Alternating hardmasks for tight-pitch line formation von Felix, Nelson M, Liu, Chi-Chun, Burns, Sean D, Mignot, Yann A. M, Sieg, Stuart A

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Self aligned pattern formation post spacer etchback in tight pitch configurations von Clevenger, Lawrence A, Felix, Nelson M, Saulnier, Nicole A, Penny, Christopher J, Quon, Roger A, Burns, Sean D, Colburn, Matthew E, Kanakasabapathy, Sivananda K

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