Influence of benthic diatoms on the nutrient release from sediments of shallow lakes recovering from eutrophication von Van Luijn, F., Van der Molen, D. T., Luttmer, W. J., Boers, P. C. M.

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The use of cohorts and populations in chronic toxicity studies with Daphnia magna: A cadmium example von van Leeuwen, C.J., Luttmer, W.J., Griffioen, P.S.

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p16/Ki-67 dual-stained cytology for detecting cervical (pre)cancer in a HPV-positive gynecologic outpatient population von Luttmer, Roosmarijn, Dijkstra, Maaike G, Snijders, Peter J F, Berkhof, Johannes, van Kemenade, Folkert J, Rozendaal, Lawrence, Helmerhorst, Theo J M, Verheijen, René H M, ter Harmsel, W Abraham, van Baal, W Marchien, Graziosi, Peppino G C M, Quint, Wim G V, Spruijt, Johan W M, van Dijken, Dorenda K E, Heideman, Daniëlle A M, Meijer, Chris J L M

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Chemical–mechanical polishing of SiOC organosilicate glasses: the effect of film carbon content von Borst, Christopher L., Korthuis, Vincent, Shinn, Gregory B., Luttmer, J.D., Gutmann, Ronald J., Gill, William N.

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Characterization and aluminum metallization of a parylene AF-4 surface von Sutcliffe, R, Lee, W.W, Gaynor, J.F, Luttmer, J.D, Martini, D, Kelber, J, Plano, M.A

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A novel process for fabricating conformal and stable TiN-based barrier films von LU, J. P, HSU, W. Y, HONG, Q. Z, DIXIT, G. A, LUTTMER, J. D, HAVEMANN, R. H, MAGEL, L. K

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Effect of Ar sputter etch on the texture of Ti and Al/TiN/Ti metal stack von HSU, W.-Y, HONG, Q.-Z, LIU, H.-Y, DOUGLAS, M, TAYLOR, K, MAGEL, L. K, LUTTMER, J. D, HAVEMANN, R. H

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Document processing system for processing a print job von Geels, Jan H, Luttmer, Maurice L. M, Helder, Matthieu W. J, Van Horssen, Ernst P

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DOCUMENT PROCESSING SYSTEM FOR PROCESSING A PRINT JOB von LUTTMER, Maurice L. M, HELDER, Matthieu W. J, VAN HORSSEN, Ernst P, GEELS, Jan H

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DOCUMENT PROCESSING SYSTEM FOR PROCESSING A PRINT JOB von HELDER Matthieu W. J, VAN HORSSEN Ernst P, LUTTMER Maurice L. M, GEELS Jan H

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Thermal stability of Al/barrier/TiSi sub(x) multilayer structures von Lu, J P, Hsu, W Y, Hong, Q Z, Dixit, G A, Luttmer, J D, Havemann, R H, Chen, P J, Tsai, H L, Magel, L K

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Graph states as ground states of many-body spin-1/2 Hamiltonians von Nest, M. Van den, Luttmer, K, Dür, W, Briegel, H. J

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Understanding and eliminating defects in electroplated Cu films von Lu, J.P., Chen, L., Gonzalez, D., Guo, H.L., Rose, D.J., Marudachalam, M., Hsu, W.U., Liu, H.Y., Cataldi, F., Chatterjee, B., Smith, P.B., Holverson, P., Guldi, R.L., Russell, N.M., Shinn, G., Zuhoski, S., Luttmer, J.D.

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ChemInform Abstract: A New Process for Depositing Tungsten Nitride Thin Films von LU, J. P., HSU, W. Y., LUTTMER, J. D., MAGEL, L. K., TSAI, H. L.

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Method for deposition of silicon oxide on a wafer von FREEMAN, DEAN W, SMITH, PATRICIA B, DAVIS, CECIL J, LUTTMER, JOSEPH D

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