3D modeling of feature-scale fluorocarbon plasma etching in silica von Rodrigues, Frâncio, Felipe Aguinsky, Luiz, Lenz, Christoph, Hössinger, Andreas, Weinbub, Josef

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Modeling Incomplete Conformality during Atomic Layer Deposition in High Aspect Ratio Structures von Luiz Felipe Aguinsky, Rodrigues, Frâncio, Reiter, Tobias, Klemenschits, Xaver, Filipovic, Lado, Hössinger, Andreas, Weinbub, Josef

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Phenomenological modeling of low-bias sulfur hexafluoride plasma etching of silicon von Aguinsky, Luiz Felipe, Rodrigues, Frâncio, Wachter, Georg, Trupke, Michael, Schmid, Ulrich, Hössinger, Andreas, Weinbub, Josef

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