Microwave plasma generation by the fast rotation and slow pulsation of resonant fields in a cylindrical cavity von Hasegawa, Yuichi, Nakamura, Keiji, Lubomirsky, Dima, Park, Soonam, Kobayashi, Satoru, Sugai, Hideo

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Generation of slowly rotating microwave plasma by amplitude-modulated resonant cavity von Hotta, Masaya, Hasegawa, Yuichi, Nakamura, Keiji, Lubomirsky, Dima, Park, Soonam, Kobayashi, Satoru, Sugai, Hideo

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Optimization of hollow cathode discharge electrode for damage free remote plasma removal process for semiconductor manufacturing von Cho, Tae S., Han, Qing, Yang, Dongqing, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar

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Dual Discharge Modes Operation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process von Cho, Tae S., Yi-Heng Sen, Bokka, Ramesh, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar

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Slow Rotation of Microwave Plasma by Amplitude Modulation von Hotta, Masaya, Ogawa, Daisuke, Nakamura, Keiji, Park, Soonam, Lubomirsky, Dima, Kobayashi, Satoru, Sugai, Hideo

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Density Profile Control of Microwave Plasma Generated by Cylindrical Cavity von Hotta, Masaya, Hasegawa, Yuichi, Ogawa, Daisuke, Nakamura, Keiji, Park, Soonam, Lubomirsky, Dima, Kobayashi, Satoru, Sugai, Hideo

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Real Time Monitoring of Electroless CoWP Deposition Process von Gu, Yuping, Birang, Manoocher, Shanmugasundram, Arulkumar, Lubomirsky, Dima, Cheboli, Ramakrishna

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振幅変調によるマイクロ波プラズマの低速回転 von 堀田, 将也, 小川, 大輔, 中村, 圭二, スーナム, パーク, ディマ, ルボミルスキー, 小林, 理, 菅井, 秀郎

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円筒キャビティによるマイクロ波プラズマ生成の密度分布制御 von 堀田, 将也, 長谷川, 雄一, 小川, 大輔, 中村, 圭二, スーナム, パーク, ディマ, ルボミルスキー, 小林, 理, 菅井, 秀郎

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Development of New Chemistry and Process Tool for the Selective Capping of Copper with CoWP von Weidman, Timothy, Zhu, Zhize, Fang, Hongbin, Mei, Fang, Wang, Yaxin, Shanmugasundram, Arulkumar, Kapoor, Brikram, Wijekoon, Kapila, Lubomirsky, Dima, Pancham, Ian

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