Tensile stress regulated microstructures and ferroelectric properties of Hf 0.5 Zr 0.5 O 2 films von Huo 霍, Siying 思颖, Zheng 郑, Junfeng 俊锋, Liu 刘, Yuanyang 远洋, Li 李, Yushan 育姗, Tao 陶, Ruiqiang 瑞强, Lu 陆, Xubing 旭兵, Liu 刘, Junming 俊明

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