Unbiased roughness measurements: Subtracting out SEM effects von Lorusso, Gian F., Rutigliani, Vito, Van Roey, Frieda, Mack, Chris A.

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Unbiased roughness measurements: Subtracting out SEM effects, part 2 von Lorusso, Gian F., Rutigliani, Vito, Van Roey, Frieda, Mack, Chris A.

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Determining the ultimate resolution of scanning electron microscope-based unbiased roughness measurements. I. Simulating noise von Mack, Chris A., Lorusso, Gian F.

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Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program von Hendrickx, Eric, Gronheid, Roel, Hermans, Jan, Lorusso, Gian, Foubert, Philippe, Pollentier, Ivan, Goethals, Anne-Marie, Jonckheere, Rik, Vandenberghe, Geert, Ronse, Kurt

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Three-dimensional simulation of top down scanning electron microscopy images von Grella, Luca, Lorusso, Gian, Lee, Paul, Frank, Fan, Adler, David L.

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e-beam metrology of thin resist for high NA EUVL von Lorusso, Gian Francesco, De Simone, Danilo, Zidan, Mohamed, Severi, Joren, Moussa, Alain, Dey, Bappaditya, Halder, Sandip, Goldenshtein, Alex, Houchens, Kevin, Santoro, Gaetano, Fischer, Daniel, Muellender, Angelika, Mack, Chris, Kondo, Tsuyoshi, Shohjoh, Tomoyasu, Ikota, Masami, Charley, Anne-Laure, De Gendt, Stefan, Leray, Philippe

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e-beam metrology of thin resist for high NA EUVL von Lorusso, Gian Francesco, De Simone, Danilo, Zidan, Mohamed, Severi, Joren, Moussa, Alain, Dey, Bappaditya, Halder, Sandip, Goldenshtein, Alex, Houchens, Kevin, Santoro, Gaetano, Fischer, Daniel, Muellender, Angelika, Mack, Chris, Kondo, Tsuyoshi, Shohjoh, Tomoyasu, Ikota, Masami, Charley, Anne-Laure, De Gendt, Stefan, Leray, Philippe

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Simulations of scanning electron microscopy imaging and charging of insulating structures von Grella, Luca, Lorusso, Gian, Adler, David L.

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Electron beam metrology for advanced technology nodes von Lorusso, Gian Francesco, Horiguchi, Naoto, Bömmels, Jürgen, Wilson, Christopher J., bosch, Geert Van den, Kar, Gouri Sankar, Ohashi, Takeyoshi, Sutani, Takumichi, Watanabe, Ryota, Takemasa, Yoshikata, Ikota, Masami

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Flare mitigation strategies in extreme ultraviolet lithography von Kim, Insung, Myers, Alan, III, Lawrence S. Melvin, Ward, Brian, Lorusso, Gian Francesco, Jonckheere, Rik, Goethals, Anne-Marie, Ronse, Kurt

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Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser von Zidan, Mohamed, Dey, Bappaditya, De Simone, Danilo, Severi, Joren, Charley, Anne-Laure, Halder, Sandip, Leray, Philippe, De Gendt, Stefan, Lorusso, Gian Francesco

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Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL von Zidan, Mohamed, Fischer, Daniel, Lorusso, Gian F, Severi, Joren, De Simone, Danilo, Moussa, Alain, Muellender, Angelika, Mack, Chris A, Charley, Anne-Laure, Leray, Philippe, De Gendt, Stefan

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E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography von Zidan, Mohamed, Lorusso, Gian Francesco, De Simone, Danilo, De Silva, Anuja, Haider, Ali, Verveniotis, Elisseos, Moussa, Alain, De Gendt, Stefan

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Readiness of EUV Lithography for Insertion into Manufacturing von Hendrickx, Eric, Gronheid, Roel, Hermans, Jan, Lorusso, Gian, Foubert, Philippe, Pollentier, Ivan, Goethals, Anne-Marie, Jonckheere, Rik, Vandenberghe, Geert, Ronse, Kurt

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Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography von Zidan, Mohamed, Fischer, Daniel, Severi, Joren, De Simone, Danilo, Moussa, Alain, Mullender, Angelika, Mack, Chris, Charley, Anne-Laure, Leray, Philippe, De Gendt, Stefan, Lorusso, Gian Francesco

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Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography von Severi, Joren, Lorusso, Gian F, De Simone, Danilo, Moussa, Alain, Saib, Mohamed, Duflou, Rutger, De Gendt, Stefan

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METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN von Lorusso, Gian Francesco, Severi, Joren, De Simone, Danilo

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A METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN von Lorusso, Gian Francesco, Severi, Joren, De Simone, Danilo

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Simulations of SEM imaging and charging von Grella, Luca, Lorusso, Gian, Niemi, Tim, Adler, David L

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PATTERN HEIGHT METROLOGY USING AN E-BEAM SYSTEM von Saib, Mohamed, Charley, Anne-Laure, Lorusso, Gian Francesco, Moussa, Alain, De Simone, Danilo, Severi, Joren

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