Treffer 1 - 8 von 8 für Suche 'Lim, Heewoo', Suchdauer: 0,54s Treffer weiter einschränken
  1. 1
    Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition

    Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition von Lee, Kunyoung, Jang, Woochool, Kim, Hyunjung, Lim, Heewoo, Kim, Bumsik, Seo, Hyungtak, Jeon, Hyeongtag

    Veröffentlicht in Thin solid films

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  2. 2
    Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer

    Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer von Jang, Woochool, Kim, Hyunjung, Kweon, Youngkyun, Jung, Chanwon, Cho, Haewon, Shin, Seokyoon, Kim, Hyunjun, Lim, Kyungpil, Jeon, Hyeongtag, Lim, Heewoo


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  3. 3
    Postdeposition annealing on VO2 films for resistive random-access memory selection devices

    Postdeposition annealing on VO2 films for resistive random-access memory selection devices von Lim, Heewoo, Cho, Haewon, Kim, Hyunjung, Lee, Namgue, Shin, Seokyoon, Jung, Chanwon, Kim, Hyunjun, Lim, Kyungpil, Jeon, Hyeongtag


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  4. 4
    Effect of adding an insulator between metal and semiconductor layers on contact resistance

    Effect of adding an insulator between metal and semiconductor layers on contact resistance von Kim, Hyunjung, Jang, Woochool, Lim, Heewoo, Kweon, Youngkyun, Bang, Minwook, Kwon, Saejin, Kim, Bumsik, Cho, Haewon, Jeon, Hyeongtag


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  5. 5
    The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer deposition

    The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer deposition von Kim, Hyunjung, Jang, Woochool, Shin, Changhee, Lee, Kunyoung, Lim, Heewoo, Kim, Manseok, Yuh, Junhan, Jeon, Hyeongtag


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  6. 6
    The annealing effect on work function variation of WN x C y films deposited by remote plasma atomic layer deposition

    The annealing effect on work function variation of WN x C y films deposited by remote plasma atomic layer deposition von Kim, Hyunjung, Jang, Woochool, Shin, Changhee, Lee, Kunyoung, Lim, Heewoo, Kim, Manseok, Yuh, Junhan, Jeon, Hyeongtag


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  7. 7
    Suppression of interferon-mediated anti-HBV response by single CpG methylation in the 5′-UTR of TRIM22

    Suppression of interferon-mediated anti-HBV response by single CpG methylation in the 5′-UTR of TRIM22 von Lim, Keo-Heun, Park, Eun-Sook, Kim, Doo Hyun, Cho, Kyung Cho, Kim, Kwang Pyo, Park, Yong Kwang, Ahn, Sung Hyun, Park, Seung Hwa, Kim, Kee-Hwan, Kim, Chang Wook, Kang, Hong Seok, Lee, Ah Ram, Park, Soree, Sim, Heewoo, Won, Juhee, Seok, Kieun, You, Jueng Soo, Lee, Jeong-Hoon, Yi, Nam-Joon, Lee, Kwang-Woong, Suh, Kyung-Suk, Seong, Baik L, Kim, Kyun-Hwan

    Veröffentlicht in Gut

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  8. 8
    Multiple Functions of Cellular FLIP Are Essential for Replication of Hepatitis B Virus

    Multiple Functions of Cellular FLIP Are Essential for Replication of Hepatitis B Virus von Lee, Ah Ram, Lim, Keo-Heun, Park, Eun-Sook, Kim, Doo Hyun, Park, Yong Kwang, Park, Soree, Kim, Dong-Sik, Shin, Gu-Choul, Kang, Hong Seok, Won, Juhee, Sim, Heewoo, Ha, Yea Na, Jae, Byeongjune, Choi, Seong Il, Kim, Kyun-Hwan

    Veröffentlicht in Journal of virology

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