Compressive strength of reinforced concrete column confined by composite material von Lin, Huei-Jeng, Liao, Chin-I

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VERY HIGH SELECTIVE ETCHING OF GaAs/Al0.2Ga0.8As FOR GATE RECESS PROCESS TO PSEUDOMORPHIC HIGH ELECTRON MOBILITY TRANSISTORS (PHEMT) APPLICATIONS USING CITRIC BUFFER SOLUTION von Liao, C-I, Sze, P-W, Houng, M-P, Wang, Y-H

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High Quality SiGe:B of High Ge Layer for 14nm and Beyond FINFET Processes von Liao, Chin I, Chen, Chun Yua, Yu, Stan, Chien, Chin Cheng, Yang, Chan Lon, Wu, J Y, Ramachandran, Balasubramanian

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Direct Growth of High-Quality InP Layers on GaAs Substrates at Low Temperature by Metalorganic Vapor Phase Epitaxy von Liao, Chin-I, Yarn, Kao-Feng, Lin, Chien-Lien, Lin, Yu-Lu, Wang, Yeong-Her

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DIRECT GROWTH OF HIGH-QUALITY InxGa1-xAs STRAINED LAYERS ON MISORIENTED GaAs SUBSTRATES GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION von Liao, C-I, Yarn, K-F, Lin, C-L, Wang, Y-H

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Print-through Phenomenon on the Surface of GFRP: Pilot Study von Lin, Huei-Jeng, Liao, Chin-I, Jiang, Ren-Li, Kuo, Yan-Min

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Methods to Reduce the Print-through Phenomenon on the Surface of FRP von Lin, Huei-Jeng, Liao, Chin-I, Jiang, Ren-Li

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A Selection Model to Logistic Centers Based on TOPSIS and MCGP Methods: The Case of Airline Industry von Chen, Kou-Huang, Liao, Chin-Nung, Wu, Li-Chun

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Estimating the Elastic Modulus through the Thickness Direction of a Uni-direction Lamina which Possesses Transverse Isotropic Property von Kuo, Y.-M., Lin, H.-J., Wang, C.-N., Liao, C.-I

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Effectiveness of Si Seed for Selective SiGe Epitaxial Deposition in Recessed Source and Drain for Locally Strained pMOS Application von Cheng, Po Lun, Liao, Chin I, Wu, Hou Ren, Chen, Yi Cheng, Chien, Chin Cheng, Yang, Chan Lon, Tzou, S F, Tang, Jinsong, Cho, Yonah, Sanchez, Errol, Chang, Vincent C, Fu, Tony, Hsu, Wen S.

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NMOS SiP Epitaxy Process - Optimizing Facet Growth von Liao, Chin I., Chien, Chin Cheng, Chan, Michael, Yang, Chan Lon, Wu, J. Y., Chung, Chuck, Ramachandran, Balasubramanian

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High Quality Silicon Cap Layer for 28nm and Beyond PMOS Processes von Liao, Chin I., Hsuan, Teng Chun, Chien, Chin Cheng, Chan, Michael, Yang, Chan Lon, Wu, J. Y., Ramachandran, Balasubramanian

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Delay-Range-Dependent Global Robust Passivity Analysis of Discrete-Time Uncertain Recurrent Neural Networks with Interval Time-Varying Delay von Lu, Chien-Yu, Liao, Chin-Wen, Tsai, Hsun-Heng

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Effective Surface Treatments for Selective Epitaxial SiGe Growth in Locally Strained pMOSFETs von Chin-I Liao, Yi-Cheng Chen, Po-Lun Cheng, Hsiang-Ying Wang, Chin-Cheng Chien, Chan-Lon Yang, Huang, K.T., Tzou, S.F., Jinsong Tang, Kodali, R., Washington, L., Chang, V.C., Fu, T., Yonah Cho

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SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF von CHANG SHIHIEH, LIAO CHIN-I

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Very High Selective Etching of GaAs/Al 0.2 Ga 0.8 As for Gate Recess Process to Pseudomorphic High Electron Mobility Transistors (PHEMT) Applications Using Citric Buffer Solution von Liao, Chin-I, Sze, Po-Wen, Houng, Mau-Phon, Wang, Yeong-Her

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Removing method von LIAO CHIN-I, TUNG YUNG

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Gradient dopant of strained substrate manufacturing method of semiconductor device von LIAO CHIN-I, CHIEN CHINNG

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MOS transistor process von LIAO CHIN-I, CHIEN CHINNG

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REMOVING METHOD von LIAO CHIN-I, TUNG YUNG

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