Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spect... von Vandenbroucke, Sofie S. T., Levrau, Elisabeth, Minjauw, Matthias M., Van Daele, Michiel, Solano, Eduardo, Vos, Rita, Dendooven, Jolien, Detavernier, Christophe

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In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry von Dendooven, Jolien, Devloo-Casier, Kilian, Levrau, Elisabeth, Van Hove, Robbert, Pulinthanathu Sree, Sreeprasanth, Baklanov, Mikhail R, Martens, Johan A, Detavernier, Christophe

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(Invited) Contacts in Advanced CMOS: History and Emerging Challenges von Lavoie, Christian, Adusumilli, Praneet, Carr, Adra V, Jordan Sweet, Jean S., Ozcan, Ahmet S, Levrau, Elisabeth, Breil, Nicolas, Alptekin, Emre

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Atomic Layer Deposition of TiO2 on Surface Modified Nanoporous Low‑k Films von Levrau, Elisabeth, Devloo-Casier, Kilian, Dendooven, Jolien, Ludwig, Karl F, Verdonck, Patrick, Meersschaut, Johan, Baklanov, Mikhail. R, Detavernier, Christophe

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Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using IR-spectroscopy and X-ray photoelectron spectroscopy von Vandenbroucke, Sofie S. T, Levrau, Elisabeth, Minjauw, Matthias M, Van Daele, Michiel, Solano, Eduardo, Vos, Rita, Dendooven, Jolien, Detavernier, Christophe

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Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator von Yebo, Nebiyu A, Sree, Sreeprasanth Pulinthanathu, Levrau, Elisabeth, Detavernier, Christophe, Hens, Zeger, Martens, Johan A, Baets, Roel

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Tuning the Pore Size of Ink-Bottle Mesopores by Atomic Layer Deposition von Dendooven, Jolien, Goris, Bart, Devloo-Casier, Kilian, Levrau, Elisabeth, Biermans, Ellen, Baklanov, Mikhail R, Ludwig, Karl F, Voort, Pascal Van Der, Bals, Sara, Detavernier, Christophe

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In Situ IR Spectroscopic Investigation of Alumina ALD on Porous Silica Films: Thermal versus Plasma-Enhanced ALD von Levrau, Elisabeth, Van de Kerckhove, Kevin, Devloo-Casier, Kilian, Pulinthanathu Sree, Sreeprasanth, Martens, Johan A, Detavernier, Christophe, Dendooven, Jolien

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In Situ IR Spectroscopic Investigation of Alumina ALD on Porous Silica Films: Thermal versus Plasma-Enhanced ALD von Levrau, Elisabeth, Van de Kerckhove, Kevin, Devloo-Casier, Kilian, Pulinthanathu Sree, Sreeprasanth, Martens, Johan, Detavernier, Christophe, Dendooven, Jolien

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Atomic Layer Deposition of TiO 2 on Surface Modified Nanoporous Low- k Films von Levrau, Elisabeth, Devloo-Casier, Kilian, Dendooven, Jolien, Ludwig, Karl F., Verdonck, Patrick, Meersschaut, Johan, Baklanov, Mikhail. R., Detavernier, Christophe

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Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator von Yebo, Nebiyu Adello, Sree, Sreeprasanth Pulinthanathu, Levrau, Elisabeth, Detavernier, Christophe, Hens, Zeger, Martens, Johan A, Baets, Roel

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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films von Sun, Yiting, Levrau, Elisabeth, Zhang, Liping, Geypen, Jef, Meersschaut, Johan, Franquet, Alexis, Le, Quoc Toan, de Marneffe, Jean-François, Bender, Hugo, Struyf, Herbert, Detavernier, Christophe, Baklanov, Mikhail, De Feyter, Steven, Armini, Silvia

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Stuffing-enabled surface confinement of silanes used as sealing agents on CF sub(4) plasma-exposed 2.0 p-OSG films von Sun, Yiting, Levrau, Elisabeth, Zhang, Liping, Geypen, Jef, Meersschaut, Johan, Franquet, Alexis, Le, Quoc Toan, de Marneffe, Jean-Francois, Bender, Hugo, Struyf, Herbert, Detavernier, Christophe, Baklanov, Mikhail, De Feyter, Steven, Armini, Silvia

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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films von Sun, Yiting, Levrau, Elisabeth, Zhang, Liping, Geypen, Jef, Meersschaut, Johan, Franquet, Alexis, Quoc Toan Le, de Marneffe, Jean-Francois, Bender, Hugo, Struyf, Herbert, Detavemier, Christophe, Baklanov, Mikhail, De Feyter, Steven, Armini, Silvia

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Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties von Goethals, Frederik, Levrau, Elisabeth, Pollefeyt, Glenn, Baklanov, Mikhail R., Ciofi, Ivan, Vanstreels, Kris, Detavernier, Christophe, Van Driessche, Isabel, Van Der Voort, Pascal

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Pore narrowing of mesoporous silica materials von Goethals, Frederik, Levrau, Elisabeth, De Canck, Els, Baklanov, Mikhail R, Detavernier, Christophe, Van Driessche, Isabel, Van Der Voort, Pascal

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Modification of Ultra Low-k Dielectric Films by O 2 and CO 2 Plasmas von Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.

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Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas von Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W, Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R

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Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas von Olawumi, Teju Tunde, Levrau, Elisabeth, Krishtab, Mikhail, Detavernier, Christophe, Bartha, Johann W., Xu, Kaidong, Lazzarino, Frederic, Baklanov, Mikhail R.

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Pore Narrowing of Mesoporous Silica Materials von Goethals, Frederik, Levrau, Elisabeth, De Canck, Els, Baklanov, Mikhail R, Detavernier, Christophe, Van Driessche, Isabel, Van Der Voort, Pascal

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