Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy von Engeln, R, Letourneur, K.G.Y, Boogaarts, M.G.H, van de Sanden, M.C.M, Schram, D.C

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Plasma chemistry during deposition of a-C:H von Benedikt, J., Letourneur, K.G.Y., Wisse, M., Schram, D.C., van de Sanden, M.C.M.

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Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H von van de Sanden, M.C.M, van Hest, M.F.A.M, de Graaf, A, Smets, A.H.M, Letourneur, K.G.Y, Boogaarts, M.G.H, Schram, D.C

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Plasma chemistry of an expanding Ar/C 2H 2 plasma used for fast deposition of a-C:H von van de Sanden, M.C.M, van Hest, M.F.A.M, de Graaf, A, Smets, A.H.M, Letourneur, K.G.Y, Boogaarts, M.G.H, Schram, D.C

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