TaSiN diffusion barriers deposited by reactive magnetron sputtering von Letendu, F., Hugon, M.C., Agius, B., Vickridge, I., Berthier, C., Lameille, J.M.

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Oxidation resistance of TaSiN diffusion barriers von Letendu, F., Hugon, M. C., Desvignes, J. M., Agius, B., Vickridge, I, Kim, D. J., Kingon, A. I.

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18O study of the oxidation of reactively sputtered Ti1−xAlxN barrier von Hugon, M. C., Varniere, F., Letendu, F., Agius, B., Vickridge, I., Kingon, A. I.

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18 O study of the oxidation of reactively sputtered Ti 1− x Al x N barrier von Hugon, M. C., Varniere, F., Letendu, F., Agius, B., Vickridge, I., Kingon, A. I.

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STUDY OF THE OXIDATION OF REACTIVELY SPUTTERED Ti1-xAlxN BARRIER von Hugon, M C, Varniere, F, Letendu, F, Agius, B, Vickridge, I, Kingon, A I

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