The structure and the photocatalytic activity of titania based nanotube and nanofiber coatings von Radtke, A., Piszczek, P., Topolski, A., Lewandowska, Ż., Talik, E., Andersen, I. Hald, Nielsen, L. Pleth, Heikkilä, M., Leskelä, M.

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Preparation of regularly structured nanotubular TiO sub(2) thin films on ITO and their modification with thin ALD-grown layers von Tupala, J, Kemell, M, Haerkoenen, E, Ritala, M, Leskelae, M

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Programming nanostructured soft biological surfaces by atomic layer deposition von Szilágyi, Imre Miklós, Teucher, Georg, Härkönen, Emma, Färm, Elina, Hatanpää, Timo, Nikitin, Timur, Khriachtchev, Leonid, Räsänen, Markku, Ritala, Mikko, Leskelä, Markku

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Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition von Castán, H., García, H., Dueñas, S., Bailón, L., Miranda, E., Kukli, K., Kemell, M., Ritala, M., Leskelä, M.

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Single-parameter model for the post-breakdown conduction characteristics of HoTiO sub(x)-based MIM capacitors von Blasco, J, Castan, H, Garcia, H, Duenas, S, Sune, J, Kemell, M, Kukli, K, Ritala, M, Leskelae, M, Miranda, E

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Nitrogen induced modifications of MANOS memory properties von Nikolaou, N., Ioannou-Sougleridis, V., Dimitrakis, P., Normand, P., Skarlatos, D., Giannakopoulos, K., Ladas, S., Pecassou, B., BenAssayag, G., Kukli, K., Niinistö, J., Ritala, M., Leskelä, M.

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Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition von Puurunen, R.L., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M., Kattelus, H.

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Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors von Blasco, J., Castán, H., García, H., Dueñas, S., Suñé, J., Kemell, M., Kukli, K., Ritala, M., Leskelä, M., Miranda, E.

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Electrical Properties of Atomic-Layer-Deposited Thin Gadolinium Oxide High-k Gate Dielectrics von Dueñas, S., Castán, H., García, H., Gómez, A., Bailón, L., Kukli, K., Hatanpää, T., Lu, J., Ritala, M., Leskelä, M.

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Atomic Layer Deposition of Osmium von Haemaelaeinen, J, Sajavaara, T, Puukilainen, E, Ritala, M, Leskelae, M

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(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium von Hämäläinen, Jani, Hatanpää, Timo, Puukilainen, Esa, Costelle, Leila, Pilvi, Tero, Ritala, Mikko, Leskelä, Markku

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Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers von Nevalainen, K., Suihkonen, R., Eteläaho, P., Vuorinen, J., Järvelä, P., Isomäki, N., Hintze, C., Leskelä, M.

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Atomic layer epitaxy growth of TiN thin films von RITALA, M, LESKELÄ, M, RAUHALA, E, HAUSSALO, P

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Identification of spatial localization and energetic position of electrically active defects in amorphous high-k dielectrics for advanced devices von García, H., Dueñas, S., Castán, H., Bailón, L., Kukli, K., Aarik, J., Ritala, M., Leskelä, M.

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Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films von Dueñas, S., Castán, H., García, H., Bailón, L., Kukli, K., Lu, J., Ritala, M., Leskelä, M.

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Destruction of Deinococcus geothermalis biofilm by photocatalytic ALD and sol-gel TiO sub(2) surfaces von Raulio, M, Pore, V, Areva, S, Ritala, M, Leskelae, M, Linden, M, Rosenholm, J B, Lounatmaa, K, Salkinoja-Salonen, M

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Growth of indium-tin-oxide thin films by atomic layer epitaxy von ASIKAINEN, T, RITALA, M, LESKELÄ, M

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Applications of rare earth in full-colour EL displays von Leskelae, M, Niinistoe, L

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Growth of In[sub 2]O[sub 3] thin films by atomic layer epitaxy von Asikainen, T., Ritala, M., Leskelae, M.

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Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes von Hiltunen, L., Kattelus, H., Leskelä, M., Mäkelä, M., Niinistö, L., Nykänen, E., Soininen, P., Tiittad, M.

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