The structure and the photocatalytic activity of titania based nanotube and nanofiber coatings von Radtke, A., Piszczek, P., Topolski, A., Lewandowska, Ż., Talik, E., Andersen, I. Hald, Nielsen, L. Pleth, Heikkilä, M., Leskelä, M.

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Electrodeposition of Cu on Ru Barrier Layers for Damascene Processing von Moffat, T. P., Walker, M., Chen, P. J., Bonevich, J. E., Egelhoff, W. F., Richter, L., Witt, C., Aaltonen, T., Ritala, M., Leskelä, M., Josell, D.

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Atomic layer epitaxy - a valuable tool for nanotechnology? von Ritala, Mikko, Leskelä, Markku

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Slot waveguide ring resonators coated by an atomic layer deposited organic/inorganic nanolaminate von Autere, A, Karvonen, L, Säynätjoki, A, Roussey, M, Färm, E, Kemell, M, Tu, X, Liow, T Y, Lo, G Q, Ritala, M, Leskelä, M, Honkanen, S, Lipsanen, H, Sun, Z

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Ruthenium Thin Films Grown by Atomic Layer Deposition von Aaltonen, T., Alén, P., Ritala, M., Leskelä, M.

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Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources von Ritala, Mikko, Kukli, Kaupo, Rahtu, Antti, Räisänen, Petri I., Leskelä, Markku, Sajavaara, Timo, Keinonen, Juhani

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Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water von Kukli, K., Ritala, M., Sajavaara, T., Keinonen, J., Leskelä, M.

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Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen von Aaltonen, T., Ritala, M., Arstila, K., Keinonen, J., Leskelä, M.

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Influence of growth and annealing temperatures on the electrical properties of Nb2O5-based MIM capacitors von García, H, Castán, H, Perez, E, Dueñas, S, Bailón, L, Blanquart, T, Niinistö, J, Kukli, K, Ritala, M, Leskelä, M

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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process von Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Ritala, Mikko, Leskelä, Markku

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Post-stroke depression, executive dysfunction and functional outcome von Pohjasvaara, T., Leskelä, M., Vataja, R., Kalska, H., Ylikoski, R., Hietanen, M., Leppävuori, A., Kaste, M., Erkinjuntti, T.

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A bio-originated porous template for the fabrication of very long, inorganic nanotubes and nanowires von Mumm, F, Kemell, M, Leskelä, M, Sikorski, P

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Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor von Niinistö, J., Putkonen, M., Niinistö, L., Kukli, K., Ritala, M., Leskelä, M.

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Electrical Properties of Atomic-Layer-Deposited Thin Gadolinium Oxide High-k Gate Dielectrics von Dueñas, S., Castán, H., García, H., Gómez, A., Bailón, L., Kukli, K., Hatanpää, T., Lu, J., Ritala, M., Leskelä, M.

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Enhanced stability of rubbery amylose-rich maize starch films plasticized with a combination of sorbitol and glycerol von Krogars, K, Heinämäki, J, Karjalainen, M, Niskanen, A, Leskelä, M, Yliruusi, J

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Growth of ultra thin PbS films by SILAR technique von Puišo, J., Lindroos, S., Tamulevičius, S., Leskelä, M., Snitka, V.

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Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition von RITALA, Mikko, KALSI, Pia, RIIHELä, Diana, KUKLI, Kaupo, LESKELä, Markku, JOKINEN, Janne

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Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water von Pore, V., Rahtu, A., Leskelä, M., Ritala, M., Sajavaara, T., Keinonen, J.

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SILAR deposition of CdxZn1-xS thin films von LAUKAITIS, G, LINDROOS, S, TAMULEVICIUS, S, LESKELÄ, M, RACKAITIS, M

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Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors von Blasco, J., Castán, H., García, H., Dueñas, S., Suñé, J., Kemell, M., Kukli, K., Ritala, M., Leskelä, M., Miranda, E.

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