Influence of the target–substrate distance on the growth of YSZ thin films von Lamas, Jérika S., Leroy, Wouter P., Depla, Diederik

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Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering von Saraiva, Marta, Chen, Hong, Leroy, Wouter P., Mahieu, Stijn, Jehanathan, Neerushana, Lebedev, Oleg, Georgieva, Violeta, Persoons, Rosita, Depla, Diederik

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Study on reactive sputtering of yttrium oxide: Process and thin film properties von Lei, Pei, Leroy, Wouter, Dai, Bing, Zhu, Jiaqi, Chen, Xiaoting, Han, Jiecai, Depla, Diederik

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Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films von Van Steenberge, Sigelinde, Leroy, Wouter, Depla, Diederik

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Deposition of thin films by sputtering cold isostatically pressed powder targets: A case study von Boydens, Francis, Leroy, Wouter, Persoons, Rosita, Depla, Diederik

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Smart textiles: an explorative study of the use of magnetron sputter deposition von Depla, Diederik, Segers, Siegfried, Leroy, Wouter, Van Hove, Tom, Van Parys, Marc

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Method to Determine the Sticking Coefficient of O 2 on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry von Leroy, Wouter P., Mahieu, Stijn, Persoons, Rosita, Depla, Diederik

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Thin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors von Leroy, Wouter, Detavernier, Christophe, Vanmeirhaeghe, Roland, LAVOIE, C

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Method to Determine the Sticking Coefficient of O sub(2) on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry von Leroy, Wouter P, Mahieu, Stijn, Persoons, Rosita, Depla, Diederik

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Method to Determine the Sticking Coefficient of O2 on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry von Leroy, Wouter P., Mahieu, Stijn, Persoons, Rosita, Depla, Diederik

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Proceedings of ICTF 14 & RSD 2008 von De Gryse, Roger, Depla, Diederik, Poelman, Dirk, Mahieu, Stijn, Leroy, Wouter, Poelman, Hilde

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Solid-state formation of titanium carbide and molybdenum carbide as contacts for carbon-containing semiconductors von Leroy, Wouter, Detavernier, Christophe, Vanmeirhaeghe, Roland, KELLOCK, AJ, LAVOIE, C

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A fundamental study of advanced metal/semiconductor contacts von Leroy, Wouter

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Linking functional properties of transition metals to growth parameters von Leroy, Wouter, Depla, Diederik

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The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering von Leroy, Wouter, Depla, Diederik

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Nanostructured thin films of yttria-stabilized zirconia von Lamas, Jérika, Leroy, Wouter, Depla, Diederik

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Modeling the time dependency of the reactive sputter process von Strijckmans, Koen, Leroy, Wouter, Depla, Diederik

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Understanding the growth of doped ceria thin films von Van Steenberge, Sigelinde, Leroy, Wouter, Depla, Diederik

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Depositie van complexe materialen von Depla, Diederik, Leroy, Wouter

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Reactive sputtering in 5D von Strijckmans, Koen, Leroy, Wouter, Depla, Diederik

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