Low on-Resistance SOI Dual-Trench-Gate MOSFET von Xiaorong Luo, Lei, T. F., Wang, Y. G., Yao, G. L., Jiang, Y. H., Zhou, K., Wang, P., Zhang, Z. Y., Jie Fan, Wang, Q., Ge, R., Bo Zhang, Zhaoji Li, Udrea, F.

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Current Knowledge and Attitudes About Organ Donation and Transplantation Among Chinese University Students von Chen, J.X., Zhang, T.M., Lim, F.L., Wu, H.C., Lei, T.F., Yeong, P.K., Xia, S.J.

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A physical model for the hysteresis phenomenon of the ultrathin ZrO2 film von Wang, J. C., Chiao, S. H., Lee, C. L., Lei, T. F., Lin, Y. M., Wang, M. F., Chen, S. C., Yu, C. H., Liang, M. S.

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Charge Retention Loss in a HfO2 Dot Flash Memory via Thermally Assisted Tunneling von TAHUI WANG, MA, H. C, LI, C. H, LIN, Y. H, CHIEN, C. H, LEI, T. F

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A one-step single-cleaning solution for CMOS processes von CHAO, T. S, YEH, C. H, PAN, T. M, LEI, T. F, LIE, Y. H

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A novel dynamic threshold voltage MOSFET (DTMOS) using heterostructure channel of Si1-yCy interlayer von SHIEH, Ming-Shan, CHEN, Pang-Shiu, TSAI, M.-J, LEI, T. F

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Mechanism of nitrogen coimplant for suppressing boron penetration in p +-polycrystalline silicon gate of p metal–oxide semiconductor field effect transistor von Chao, T. S., Liaw, M. C., Chu, C. H., Chang, C. Y., Chien, C. H., Hao, C. P., Lei, T. F.

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Self-aligned fabrication of thin-film transistors with field-induced drain von Yu, C.M, Lin, H.C, Lin, C.Y, Yeh, K.L, Huang, T.Y, Lei, T.F

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Charge Retention Loss in a \hbox Dot Flash Memory via Thermally Assisted Tunneling von Tahui Wang, Ma, H.C., Li, C.H., Lin, Y.H., Chien, C.H., Lei, T.F.

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Influence of measuring environment on the electrical characteristics of pentacene-based thin film transistors von Wang, Yu-Wu, Cheng, Horng-Long, Wang, Yi-Kai, Hu, Tang-Hsiang, Ho, Jia-Chong, Lee, Cheng-Chung, Lei, Tan-Fu, Yeh, Ching-Fa

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The Impact of Deep Ni Salicidation and$hboxNH_3$Plasma Treatment on Nano-SOI FinFETs von You, H.-C., Kuo, P.-Y., Ko, F.-H., Chao, T.-S., Lei, T.-F.

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Impact of nitrogen and/or fluorine implantation on deep-submicron Co–salicide process von Chang, T.Y, Lei, T.F, Chao, T.S, Chen, S.W, Kao, L.M, Chen, S.K, Tuan, A, Su, T.P

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Characteristics of boron diffusion in polysilicon/silicon systems with a thin Si-B layer as diffusion source von CHEN, T. P, LEI, T. F, LIN, H. C, CHANG, C. Y

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Investigation on the distribution of fluorine and boron in polycrystalline silicon/silicon systems von CHEN, T. P, LEI, T. F, CHANG, C. Y, HSIEH, W. Y, CHEN, L. J

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Plasma charging damage and water-related hot-carrier reliability in the deposition of plasma-enhanced tetraethylorthosilicate oxide von LIN, Y. M, JANG, S. M, YU, C. H, LEI, T. F, CHEN, J. Y

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Fullerene-incorporation for enhancing the electron beam resist performance for contact hole patterning and filling von You, Hsin-Chiang, Ko, Fu-Hsiang, Lei, Tan-Fu

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Suppression of boron penetration in p+-poly-Si gate metal-oxide-semiconductor transistor using nitrogen implantation von CHAO, T. S, CHIEN, C. H, HAO, C. P, LIAW, M. C, CHU, C. H, CHANG, C. Y, LEI, T. F, SUN, W. T, HSU, C. H

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Characterization of ultrathin oxide prepared by low-temperature wafer loading and nitrogen preannealing before oxidation von WU, S. L, LEE, C. L, LEI, T. F, LIANG, M. S

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Improvement of water-related hot-carrier reliability by optimizing the plasma-enhanced tetra-ethoxysilane deposition process von LIN, Y. M, JANG, S. M, YU, C. H, LEI, T. F

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Suppression of the floating-body effect in poly-Si thin-film transistors with self-aligned Schottky barrier source and ohmic body contact structure von KUO, Po-Yi, CHAO, Tien-Sheng SR, LEI, Tan-Fu

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