Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films von Williams, P. A., Roberts, J. L., Jones, A. C., Chalker, P. R., Tobin, N. L., Bickley, J. F., Davies, H. O., Smith, L. M., Leedham, T. J.

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Use of the ‘mist’ (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroe... von Morrison, F.D., Scott, J.F., Alexe, M., Leedham, T.J., Tatsuta, T., Tsuji, O.

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Nickel oxide sol–gel films from nickel diacetate for electrochromic applications von Garcia-Miquel, J.L, Zhang, Q, Allen, S.J, Rougier, A, Blyr, A, Davies, H.O, Jones, A.C, Leedham, T.J, Williams, P.A, Impey, S.A

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Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor von Matero, R., Ritala, M., Leskelä, M., Jones, A.C., Williams, P.A., Bickley, J.F., Steiner, A., Leedham, T.J., Davies, H.O.

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Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD von DECAMS, J. M, GUILLON, H, RUSWORTH, S, LEEDHAM, T. J, DAVIES, H, FANG, Q, BOYD, I, JIMENEZ, C, AUDIER, M, SENATEUR, J. P, DUBOURDIEU, C, CADIX, O, O'SULLIVAN, B. J, MODREANU, M, HURLEY, P. K

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Liquid injection metal organic chemical vapour deposition of nickel zinc ferrite thin films von Lane, P.A, Wright, P.J, Crosbie, M.J, Pitt, A.D, Reeves, C.L, Cockayne, B, Jones, A.C, Leedham, T.J

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Liquid injection metal organic chemical vapour deposition of lead–scandium–tantalate thin films for infrared devices von Crosbie, M.J, Lane, P.A, Wright, P.J, Williams, D.J, Jones, A.C, Leedham, T.J, Reeves, C.L, Jones, J

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Electrical characterization of HfO 2 films obtained by UV assisted injection MOCVD von Decams, J.M., Guillon, H., Jiménez, C., Audier, M., Sénateur, J.P., Dubourdieu, C., Cadix, O., O’Sullivan, B.J., Modreanu, M., Hurley, P.K., Rusworth, S., Leedham, T.J., Davies, H., Fang, Q., Boyd, I.

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The Unusual Thermal Stabilization of MOCVD Precursors by the Dibenzoyl Methanate Group: Liquid Injection MOCVD of Tantalum Oxide and Niobium Oxide Using M(OEt)4(dbm) Precursors von Williams, P. A., Jones, A. C., Wright, P. J., Crosbie, M. J., Bickley, J. F., Steiner, A., Davies, H. O., Leedham, T. J.

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The control of growth dynamics by the use of designed precursors for the MOCVD of electronic ceramics: Part II von Jones, A.C, Leedham, T.J, Wright, P.J, Crosbie, M.J, Williams, D.J, Davies, H.O, Fleeting, K.A, O’Brien, P, Pemble, M.E

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The control of growth dynamics by the use of designed precursors for the MOCVD of electronic ceramics von Jones, A.C, Leedham, T.J, Wright, P.J, Crosbie, M.J, Williams, D.J, Davies, H.O, Fleeting, K.A, O’Brien, P, Pemble, M.E

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