Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics von Lee, Hyo-Chang

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Low‐Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma von Kim, Keon‐Woo, Seok, Hyunho, Son, Sihoon, Park, Su‐Jeong, Yang, Chanwoo, Lee, Dongho, Lee, Hyo‐Chang, Mun, Jihun, Yeom, Hee‐Jung, Yoon, Min Young, Park, Bomi, Kim, Se Hyun, Jo, Changshin, Moon, Hong Chul, Kim, Taesung, Kim, Jin Kon

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Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor von Yeom, H. J., Yoon, Min Young, Chae, Gwang-Seok, Kim, Jung Hyung, You, ShinJae, Lee, Hyo-Chang

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Unintended gas breakdowns in narrow gaps of advanced plasma sources for semiconductor fabrication industry von Son, Sung Hyun, Go, Geunwoo, Villafana, Willca, Kaganovich, Igor D, Khrabrov, Alexander, Lee, Hyo-Chang, Chung, Kyoung-Jae, Chae, Gwang-Seok, Shim, Seungbo, Na, Donghyeon, Kim, June Young

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Experimental and computational investigations of the effect of the electrode gap on capacitively coupled radio frequency oxygen discharges von You, K. H., Schulze, J., Derzsi, A., Donkó, Z., Yeom, H. J., Kim, J. H., Seong, D. J., Lee, Hyo-Chang

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Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions von Ma, Ho Jin, Kim, Seonghyeon, Kim, Ha-Neul, Kim, Mi-Ju, Ko, Jae-Woong, Lee, Jae-Wook, Kim, Jung-Hyung, Lee, Hyo-Chang, Park, Young-Jo

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Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas von Lee, Hyo-Chang, Chung, Chin-Wook, Kim, J. H., Seong, D. J.

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Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating von Kwon, Deuk-Chul, Yu, Dong-Hun, Kwon, Hyoungcheol, Im, Yeon Ho, Lee, Hyo-Chang

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Characteristics of Rhombohedral (3R) Structure of α-In2Se3 Nanosheets by Mechanical Exfoliation von Seo, Dong Hyun, Kim, Ju Won, Seong, Jin-Hoo, Lee, Hyo-Chang, Kim, Sang-il, Kim, TaeWan

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Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma von Lee, Hyo-Chang, Lee, Min-Hyong, Chung, Chin-Wook

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Discharge mode transition and hysteresis in inductively coupled plasma von Lee, Hyo-Chang, Kim, Dong-Hwan, Chung, Chin-Wook

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A study on plasma parameters in Ar/SF6 inductively coupled plasma von Oh, Seung-Ju, Lee, Hyo-Chang, Chung, Chin-Wook

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Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography von Choe, Eun‐Seok, Choi, Seungwook, Kim, Ansoon, Kim, Kwan‐Yong, Yeom, Hee‐Jung, Yoon, Min Young, Hong, Seongwan, Kim, Dong‐Wook, Kim, Jung‐Hyung, Lee, Hyo‐Chang

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E-H heating mode transition in inductive discharges with different antenna sizes von Lee, Hyo-Chang, Chung, Chin-Wook

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Preface to Special Topic “Plasma Physics and Science in Current and Next Generation Semiconductor Process”: Invited papers from The 8th International Conference on Microelectronics... von Lee, Hyo-Chang

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Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma von Lee, Hyo-Chang, Lee, Jung-Kyu, Chung, Chin-Wook

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Global model including multistep ionizations in helium plasmas von Oh, Seung-Ju, Lee, Hyo-Chang, Chung, Chin-Wook

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Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma von Lee, Hyo-Chang, Bang, Jin-Young, Chung, Chin-Wook

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Pulsed plasma measurement method using harmonic analysis von Kim, Yu-Sin, Kim, Dong-Hwan, Lee, Hyo-Chang, Chung, Chin-Wook

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Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching von Yeom, Hee-Jung, Yoon, Min Young, Choi, Daehan, Lee, Youngseok, Kim, Jung-Hyung, You, Shin-Jae, Lee, Hyo-Chang

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