Comparison of Au catalysts supported on mesoporous titania and silica: investigation of Au particle size effects and metal-support interactions von OVERBURY, S. H, ORTIZ-SOTO, Lorna, HAOGUO ZHU, BYUNGWHAN LEE, AMIRIDIS, Michael D, SHENG DAI

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Activated carbons impregnated with iron oxide nanoparticles for enhanced removal of bisphenol A and natural organic matter von Park, Hak-Soon, Koduru, Janardhan Reddy, Choo, Kwang-Ho, Lee, Byungwhan

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The methods of identification, analysis, and removal of endocrine disrupting compounds (EDCs) in water von Chang, Hyun-Shik, Choo, Kwang-Ho, Lee, Byungwhan, Choi, Sang-June

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The relationship between financial constraints and investment efficiency von Kim, Taewoo, Lee, Brandon Byungwhan, Paik, Daniel Gyung

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A Case of Spontaneous Common Iliac Atery Dissection von Noh, Juho, Rhee, Il, Kim, Minsung, Lee, Jonghyun, Kim, Kisu, Park, Byungwhan

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Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition von Lee, Su Jin, Kim, Byungwhan, Baik, Sung Wook

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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature von Lee, Hwajune, Kim, Byungwhan, Kwon, Sanghee

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Prediction on the seasonal behavior of hydrogen sulfide using a neural network model von Kim, Byungwhan, Lee, Joogong, Jang, Jungyoung, Han, Dongil, Kim, Ki-Hyun

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Impact of bias power-induced ion energy on refractive index of SiN films room-temperature deposited in SiH4–NH3–N2 pulsed plasma von Kwon, Sanghee, Lee, Hwajun, Kim, Byungwhan

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Deposition of silicon nitride film at room temperature using a SiH4–NH3–N2 plasma von LEE, Su Jin, KIM, Byungwhan

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Microtrench of oxynitride thin films in a C2F6 inductively coupled plasma von Kim, Byungwhan, Lee, Byung Teak

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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH(4)-N(2) plasma at room temperature von Lee, Hwajune, Kim, Byungwhan, Kwon, Sanghee

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Impact of bias power-induced ion energy on refractive index of SiN films room-temperature deposited in SiH 4–NH 3–N 2 pulsed plasma von Kwon, Sanghee, Lee, Hwajun, Kim, Byungwhan

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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH 4–N 2 plasma at room temperature von Lee, Hwajune, Kim, Byungwhan, Kwon, Sanghee

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Microtrench of oxynitride thin films in a C 2F 6 inductively coupled plasma von Kim, Byungwhan, Lee, Byung Teak

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MODELING OF THIN FILM PROCESS DATA USING A GENETIC ALGORITHM-OPTIMIZED INITIAL WEIGHT OF BACKPROPAGATION NEURAL NETWORK von Kim, Byungwhan, Lee, Hwajune, Kim, Donghwan

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Prediction of SiC etching in a NF3∕CH4 plasma using neural network von Kim, Byungwhan, Lee, Byung Teak

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Use of neural network to model the deposition rate of PECVD-silicon nitride films von Kim, Byungwhan, Park, Kyungyoung, Lee, Dukwoo

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Neural Network Model of Plasma Charging Damage on MOSFET Device von Kim, Byungwhan, Lee, Hwa Jun, Kim, Donghwan

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Optimization of Wavelet-Filtered In-Situ Plasma Etch Data Using Neural Network and Genetic Algorithm von Kim, Byungwhan, Kim, Daehyun, Han, Dongil, Lee, Nae-Il

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