Delineation of point defect state in Czochralski Si by modified background haze von Lee, Anselmo Jaehyeong, Hwang, Don-Ha, Kang, Hee-Bog, Lee, Bo-Young

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Practical Evaluation Method of Oxygen Precipitation in the Czochralski Silicon von Lee, Anselmo Jaehyeong, Hong, Sejun, Kim, Ja-Young, Kang, Hee-Bog, Lee, Sung-Wook

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Combined Effect of Rapid Thermal Annealing and Crystal Nature on the Gate Oxide Reliability of Czochralski Silicon von Shin, Jung-Won, Lee, Woo-Sung, Kim, Ja-Young, Lee, Anselmo Jaehyeong, Kang, Hee-Bog, Lee, Sung-Wook

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Defect Formation of Nickel-Incorporated Large-Diameter Czochralski-Grown Silicon and Their Effect on Gate Oxide Reliability von Lee, Anselmo Jaehyeong, Im, Ji-Seong, Kang, Hee-Bog, Lee, Sung-Wook

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Development of Silicon Substrate for Advanced Multi-Chip Packaging Process with the Enhanced Gettering Ability von An, Jeong-Hoon, Kim, Jang-Seop, Lee, Anselmo Jaehyeong, Park, Hyung-Kook, Park, Hyeung-il, Moon, Byeong-Sam, Lee, Sang- Hyun, Park, Jea-Gun

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Practical Evaluation Method of Oxygen Precipitation in the Czochralski Silicon von Lee, Anselmo Jaehyeong, Hong, Sejun, Kim, Ja-Young, Kang, Hee-Bog, Lee, Sung-Wook

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Combined Effect of Rapid Thermal Annealing and Crystal Nature on the Gate Oxide Reliability of Czochralski Silicon von Shin, Jung-Won, Lee, Woo-Sung, Kim, Ja-Young, Lee, Anselmo Jaehyeong, Kang, Hee-Bog, Lee, Sung-Wook

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Development of Silicon Substrate for Advanced Multi-Chip Packaging Process with the Enhanced Gettering Ability von An, Jeong-Hoon, Kim, Jang-Seop, Lee, Anselmo Jaehyeong, Park, Hyung-Kook, Park, Hyeung-il, Moon, Byeong-Sam, Lee, Sang- Hyun, Park, Jea-Gun

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