Radical-Enhanced Atomic Layer Deposition of a Tungsten Oxide Film with the Tunable Oxygen Vacancy Concentration von Romanov, Roman I, Kozodaev, Maxim G, Lebedinskii, Yury Y, Perevalov, Timofey V, Slavich, Aleksandr S, Hwang, Cheol Seong, Markeev, Andrey M

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