Emittance Growth Study of an Electron Beam in a Double-Alpha Magnet Compressor Used in an Inverse Compton Scattering X-Ray Source von Pires, A, Chauchat, A, Collet, M, Le Flanchec, V, Delerue, N

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Diagnostics for the optimization of an 11 keV inverse Compton scattering x-ray source von Chauchat, A.-S., Brasile, J.-P, Le Flanchec, V., Negre, J.-P., Binet, A., Ortega, J.-M.

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Inverse Compton scattering X-ray source yield optimization with a laser path folding system inserted in a pre-existent RF linac von Chaleil, A., Le Flanchec, V., Binet, A., Nègre, J.P., Devaux, J.F., Jacob, V., Millerioux, M., Bayle, A., Balleyguier, P., Prazeres, R.

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Instrumentation developments for production and characterisation of Inverse Compton Scattering X-rays and first results with a 17MeV electron beam von Chauchat, A.S., Le Flanchec, V., Nègre, J.P., Binet, A., Balleyguier, P., Brasile, J.P., Ortega, J.M.

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Construction of a Compton source for X-rays in the ELSA facility von Chauchat, A.S., Le Flanchec, V., Binet, A., Flament, J.L., Balleyguier, P., Brasile, J.P., Muller, S., Ortega, J.M.

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Two-Dimensional Desmearing of Centrosymmetric Small-Angle X-ray Scattering Diffraction Patterns von Le Flanchec, V., Gazeau, D., Taboury, J., Zemb, Th

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Design of a compact aberration-free achromatic 90°-bend system for the ELSA accelerator von Le Flanchec, V., Balleyguier, P., Brygoo, S., Flament, J.-L., Guimbal, Ph, Leboutet, H.

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Output Energy Fluctuations of the Nd:YAG Amplifier Chain of a Photoinjector Drive Laser System von Le Flanchec, V

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Long UV Pulse Propagation in the Atmosphere von Bourdier, A., Binet, A., Chalus, O., Diels, J. C., Guimbal, P., Le Flanchec, V.

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Electron Photo-Injector Beam Diode Driven by a 2.5 MV Pulsedpower Source for the DEINOS Project Scale Model von Lemaire, J-L, Bailly-Salins, R., Balleyguier, P., Guilhem, D., Le Flanchec, V., Millerioux, M., Pichon, S.

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Stabilization system of a photoinjector drive laser von Le Flanchec, V, Blésès, J P, Striby, S, Laget, J P

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Low cost, air cooled, 7 W 8 ns 60 kHz, infra-red laser for industrial marking application with doubling and tripling frequency module von Cormont, Ph, Le Flanchec, V., Bonnefois, A., Thro, P.Y., Weulersse, J.M.

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