High temperature cavity thermo-ionizer von Latuszyński, A, Maczka, D

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Extraction of ions from a plasma source and formation of beams von Pyszniak, A., Droździel, A., Turek, M., Latuszyński, A., Ma̧czka, D., Sielanko, J., Vaganov, Yu. A., Yushkevich, Yu. V.

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An ion source for solid elements with mechanical sputtering von Meldizon, J., Drozdziel, A., Latuszyński, A., Prucnal, S., Pyszniak, K., Mączka, D.

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Plasma ion source with hollow cathode von Latuszyński, A., Droździel, A., Pyszniak, K., Dupak, J., Mączka, D., Meldizon, J.

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Atom ionization process in the thermoionization ion source von Latuszyński, A., Pyszniak, K., Droździel, A., Turek, M., Ma¸czka, D., Meldizon, J.

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The generation of radioactive ion beams von Latuszyński, A, Ma̧czka, D, Yushkevich, Yu

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Negative ion beams from a plasma type source with additional surface ionization von Latuszyński, A, Kornarzyński, K, Droździel, A, Pyszniak, K, Ma̧czka, D

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Study of some processes in the ion sources at the UMCS mass separator von Droździel, A., Latuszyński, A., Ma̧czka, D., Pyszniak, K.

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Electromagnetic Mass-Separation and Its Applications von Maczka, D, Turek, M, Latuszynski, A, Yushkevich, Yu V

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Formation of copper nitrides in the course of implanting copper with large doses of nitrogen ions von Zukowski, P., Karwat, C., Komarov, F. F., Komarov, A. F., LatuszyńSki, A.

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Application of radioactive ion beams in the study of implanted layers von Latuszyński, A., Mączka, D.

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Numerical model for extraction of ions from plasma von Turek, M., Pyszniak, A., Drozdziel, A., Sielanko, J., Latuszynski, A., Maczka, D., Vaganov, Yu. A., Yushkevich, Yu. V.

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A modified ion source for semiconductor implantation purposes von Latuszyński, A, Máczka, D, Yushkievich, Yu V, Kiszczak, K

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The influence of ion implantation conditions on defect formation and amorphisation in silicon von Zukovski, P. V., Kiszczak, K., Maczka, D., Latuszynski, A.

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Hollow-cathode ion sources for the JASNAPP-2 facility von Latuszyński, A., Ma̧czka, D., Yushkievich, Yu.V., Kiszczak, K.

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Optimization of the ion implantation process von Maczka, D., Latuszynski, A., Kuduk, R., Partyka, J.

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Investigation of the diffusion process at electromagnetic separation of the radioactive isotopes of rare-earth elements von Latuszyński, A.

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An Attempt to Produce the Implanted 22 Na Source for Positron Spectrometry von Latuszyński, A., Yushkevich, Yu.V., Bystrov, V.A., Misak, R., Wawryszczuk, J., Goworek, T.

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The Generation of Molecular and Multiply Charged Ions in the Hollow-Cathode Ion Source von Kornarzyński, K., Kiszczak, K., Latuszyński, A., Mączka, D., Paetyka, J., Ytjshkievich, Yu. V.

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An Ion Source for Semiconductor Implantation von Latuszyński, A., Maczka, D., Yushkievich, Yu. V.

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